Complexity reduction of a thin film deposition model using a trajectory based nonlinear model reduction technique. Wolfrum, P., Vargas, A., Gallivan, M., & Allgöwer, F. In Proc.\ American Control Conf.\ (ACC), pages 2566-2571, Portland, OR, USA, 2005.
bibtex   
@INPROCEEDINGS{ist:wolfrum05a,
  author = {Wolfrum, P. and Vargas, A. and Gallivan, M. and Allg{\"o}wer, F.},
  title = {Complexity reduction of a thin film deposition model using a trajectory
	based nonlinear model reduction technique},
  booktitle = {Proc.\ American Control Conf.\ (ACC)},
  year = {2005},
  pages = {2566-2571},
  address = {Portland, OR, USA},
  pubtype = {proceeding}
}

Downloads: 0