Complexity reduction of a thin film deposition model using a trajectory based nonlinear model reduction technique. Wolfrum, P., Vargas, A., Gallivan, M., & Allgöwer, F. In Proc.\ American Control Conf.\ (ACC), pages 2566-2571, Portland, OR, USA, 2005. bibtex @INPROCEEDINGS{ist:wolfrum05a,
author = {Wolfrum, P. and Vargas, A. and Gallivan, M. and Allg{\"o}wer, F.},
title = {Complexity reduction of a thin film deposition model using a trajectory
based nonlinear model reduction technique},
booktitle = {Proc.\ American Control Conf.\ (ACC)},
year = {2005},
pages = {2566-2571},
address = {Portland, OR, USA},
pubtype = {proceeding}
}
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