Computing light masks in neutral atom lithography. Burstedde, C., Braun, J., & Kunoth, A. J. Comput. Phys., 220(1):422-440, 2006.
Computing light masks in neutral atom lithography. [link]Link  Computing light masks in neutral atom lithography. [link]Paper  bibtex   
@article{journals/jcphy/BursteddeBK06,
  added-at = {2020-02-19T00:00:00.000+0100},
  author = {Burstedde, Carsten and Braun, Jürgen and Kunoth, Angela},
  biburl = {https://www.bibsonomy.org/bibtex/2958e91225621c169f0a29d6b9b923f2b/dblp},
  ee = {https://doi.org/10.1016/j.jcp.2006.07.012},
  interhash = {48e753da02633f82dea1b4bb59e04c4b},
  intrahash = {958e91225621c169f0a29d6b9b923f2b},
  journal = {J. Comput. Phys.},
  keywords = {dblp},
  number = 1,
  pages = {422-440},
  timestamp = {2020-02-20T11:53:37.000+0100},
  title = {Computing light masks in neutral atom lithography.},
  url = {http://dblp.uni-trier.de/db/journals/jcphy/jcphy220.html#BursteddeBK06},
  volume = 220,
  year = 2006
}

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