@article{arunachalam2022machine,
  title={Machine learning approach to thickness prediction from in situ spectroscopic ellipsometry data for atomic layer deposition processes},
  author={Arunachalam, Ayush and Berriel, S Novia and Feit, Corbin and Kumar, Udit and Seal, Sudipta and Basu, Kanad and Banerjee, Parag},
  journal={Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films},
  volume={40},
  number={1},
  pages={012405},
  year={2022},
  publisher={American Vacuum Society}
}

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