@article{boominathasellarajan_study_2019,
	title = {Study on the influence of residual stress on the mechanical characteristics of free-standing {Si}-membranes processed by deep reactive ion etching},
	volume = {290},
	issn = {09244247},
	url = {https://linkinghub.elsevier.com/retrieve/pii/S0924424718316224},
	doi = {10.1016/j.sna.2019.02.034},
	language = {en},
	urldate = {2019-03-18TZ},
	journal = {Sensors and Actuators A: Physical},
	author = {Boominathasellarajan, S. and Saravanan, P. and Pandey, K.K. and Srihari, V. and Poswal, H.K.},
	month = may,
	year = {2019},
	pages = {71--79}
}

{"_id":"YNvLEoZR47boQfNYT","bibbaseid":"boominathasellarajan-saravanan-pandey-srihari-poswal-studyontheinfluenceofresidualstressonthemechanicalcharacteristicsoffreestandingsimembranesprocessedbydeepreactiveionetching-2019","downloads":0,"creationDate":"2019-04-15T08:34:56.923Z","title":"Study on the influence of residual stress on the mechanical characteristics of free-standing Si-membranes processed by deep reactive ion etching","author_short":["Boominathasellarajan, S.","Saravanan, P.","Pandey, K.","Srihari, V.","Poswal, H."],"year":2019,"bibtype":"article","biburl":"https://api.zotero.org/users/1053509/collections/IYQ8KVLX/items?key=P7i2xkMTYz6MgAdTLJxM8mTX&format=bibtex&limit=100","bibdata":{"bibtype":"article","type":"article","title":"Study on the influence of residual stress on the mechanical characteristics of free-standing Si-membranes processed by deep reactive ion etching","volume":"290","issn":"09244247","url":"https://linkinghub.elsevier.com/retrieve/pii/S0924424718316224","doi":"10.1016/j.sna.2019.02.034","language":"en","urldate":"2019-03-18TZ","journal":"Sensors and Actuators A: Physical","author":[{"propositions":[],"lastnames":["Boominathasellarajan"],"firstnames":["S."],"suffixes":[]},{"propositions":[],"lastnames":["Saravanan"],"firstnames":["P."],"suffixes":[]},{"propositions":[],"lastnames":["Pandey"],"firstnames":["K.K."],"suffixes":[]},{"propositions":[],"lastnames":["Srihari"],"firstnames":["V."],"suffixes":[]},{"propositions":[],"lastnames":["Poswal"],"firstnames":["H.K."],"suffixes":[]}],"month":"May","year":"2019","pages":"71–79","bibtex":"@article{boominathasellarajan_study_2019,\n\ttitle = {Study on the influence of residual stress on the mechanical characteristics of free-standing {Si}-membranes processed by deep reactive ion etching},\n\tvolume = {290},\n\tissn = {09244247},\n\turl = {https://linkinghub.elsevier.com/retrieve/pii/S0924424718316224},\n\tdoi = {10.1016/j.sna.2019.02.034},\n\tlanguage = {en},\n\turldate = {2019-03-18TZ},\n\tjournal = {Sensors and Actuators A: Physical},\n\tauthor = {Boominathasellarajan, S. and Saravanan, P. and Pandey, K.K. and Srihari, V. and Poswal, H.K.},\n\tmonth = may,\n\tyear = {2019},\n\tpages = {71--79}\n}\n\n","author_short":["Boominathasellarajan, S.","Saravanan, P.","Pandey, K.","Srihari, V.","Poswal, H."],"key":"boominathasellarajan_study_2019","id":"boominathasellarajan_study_2019","bibbaseid":"boominathasellarajan-saravanan-pandey-srihari-poswal-studyontheinfluenceofresidualstressonthemechanicalcharacteristicsoffreestandingsimembranesprocessedbydeepreactiveionetching-2019","role":"author","urls":{"Paper":"https://linkinghub.elsevier.com/retrieve/pii/S0924424718316224"},"downloads":0},"search_terms":["study","influence","residual","stress","mechanical","characteristics","free","standing","membranes","processed","deep","reactive","ion","etching","boominathasellarajan","saravanan","pandey","srihari","poswal"],"keywords":[],"authorIDs":[],"dataSources":["XrB753Bh7Xjb6P3om"]}