Process induced strains in FDSOI devices: a contribution of dark-field electron holography. Boureau, V., Hÿtch, M., Daniel, B., & Claverie, A. In Micro and Nano 2015, 2015.
bibtex   
@inproceedings{boureau_process_2015,
	title = {Process induced strains in {FDSOI} devices: a contribution of dark-field electron holography},
	booktitle = {Micro and {Nano} 2015},
	author = {Boureau, Victor and Hÿtch, Martin and Daniel, Benoit and Claverie, Alain},
	year = {2015},
}

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