Minimizing die fracture in three-dimensional IC advanced packaging wafer thinning process by inserting polyimide patterns. Bravo, J., Morey-Chaisemartin, P., Chang, L., Beisser, E., Brault, F., & Zusman, J. In Kim, R. & Lafferty, N. V., editors, DTCO and Computational Patterning II, volume 12495, pages 1249511, 2023. International Society for Optics and Photonics, SPIE. Paper doi bibtex @inproceedings{10.1117/12.2657011,
author = {Jaime Bravo and Philippe Morey-Chaisemartin and Lifu Chang and Eric Beisser and Frederic Brault and Joshua Zusman},
title = {{Minimizing die fracture in three-dimensional IC advanced packaging wafer thinning process by inserting polyimide patterns}},
volume = {12495},
booktitle = {DTCO and Computational Patterning II},
editor = {Ryoung-Han Kim and Neal V. Lafferty},
organization = {International Society for Optics and Photonics},
publisher = {SPIE},
pages = {1249511},
keywords = {Advanced Packaging, 3D ICs, 3D Integration, Frame Generation, Thin Wafer, Fracture, Stress, Patterning},
year = {2023},
doi = {10.1117/12.2657011},
URL = {https://doi.org/10.1117/12.2657011}
}
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