@article{ ISI:000415685300007,
Author = {Brewer, A. and Cho, K. H. and Saenrang, W. and Baek, S. H. and
   Frederick, J. C. and Eom, C. B.},
Title = {{Uniform sputter deposition of high-quality epitaxial complex oxide thin
   films}},
Journal = {{JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A}},
Year = {{2017}},
Volume = {{35}},
Number = {{6}},
Month = {{NOV}},
Abstract = {{Uniform deposition of high-quality epitaxial complex oxide thin films
   over a large area is desirable not only for the large scale fabrication
   of oxide electronics but also for preparing multiple samples with the
   same growth conditions for various characterization techniques. However,
   it is particularly challenging to grow uniform thin films of
   multicomponent oxide systems containing volatile species such as Pb and
   Bi. By combining a misaligned parallel dual planar magnetron sputtering
   technique with substrate rotation, the authors have grown uniform
   epitaxial thin films piezoelectric 0.67Pb(Mg1/3Nb2/3)O-3-0.33PbTiO(3)
   and multiferroic monodomain BiFeO3 with high-deposition rates over a 2
   in. diameter area. These films have excellent uniformity of thickness,
   stoichiometric compositions, and electrical properties. This technique
   can be scaled to larger deposition areas by using larger sputtering
   targets and widely applied to various multicomponent complex oxide thin
   film heterostructures. (C) 2017 American Vacuum Society.}},
DOI = {{10.1116/1.4998956}},
Article-Number = {{060607}},
ISSN = {{0734-2101}},
EISSN = {{1520-8559}},
Unique-ID = {{ISI:000415685300007}},
}

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