Nanocrystallized tetragonal metastable ZrO2 thin films deposited by metal-organic chemical vapor deposition for 3D capacitors (vol 519, pg 5638, 2011). Brunet, M., Kotb, H. M., Bouscayrol, L., Scheid, E., Andrieux, M., Legros, C., & Schamm-Chardon, S. Thin Solid Films, 520(9):3709–3709, February, 2012. WOS:000301627100052
doi  bibtex   
@article{brunet_nanocrystallized_2012,
	title = {Nanocrystallized tetragonal metastable {ZrO2} thin films deposited by metal-organic chemical vapor deposition for {3D} capacitors (vol 519, pg 5638, 2011)},
	volume = {520},
	issn = {0040-6090},
	doi = {10.1016/j.tsf.2011.10.009},
	language = {English},
	number = {9},
	journal = {Thin Solid Films},
	author = {Brunet, M. and Kotb, H. Mahfoz and Bouscayrol, L. and Scheid, E. and Andrieux, M. and Legros, C. and Schamm-Chardon, S.},
	month = feb,
	year = {2012},
	note = {WOS:000301627100052},
	pages = {3709--3709},
}

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