Atmospheric pressure chemical vapor deposition of methylammonium bismuth iodide thin films. Chen, X., Myung, Y., Thind, A., Gao, Z., Yin, B., Shen, M., Cho, S. B., Cheng, P., Sadtler, B., Mishra, R., & others Journal of Materials Chemistry A, 5(47):24728–24739, Royal Society of Chemistry, 2017. bibtex @article{chen2017atmospheric,
title={Atmospheric pressure chemical vapor deposition of methylammonium bismuth iodide thin films},
author={Chen, Xiao and Myung, Yoon and Thind, Arashdeep and Gao, Zhengning and Yin, Bo and Shen, Meikun and Cho, Sung Beom and Cheng, Peifu and Sadtler, Bryce and Mishra, Rohan and others},
journal={Journal of Materials Chemistry A},
volume={5},
number={47},
pages={24728--24739},
year={2017},
publisher={Royal Society of Chemistry}
}
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