Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces. De Coux, P., Bachelet, R., Warot-Fonrose, B., Skumryev, V., Lupina, L., Niu, G., Schroeder, T., Fontcuberta, J., & Sánchez, F. Applied Physics Letters, 105(1):012401, 2014. bibtex @article{de_coux_epitaxial_2014,
title = {Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces},
volume = {105},
number = {1},
journal = {Applied Physics Letters},
author = {De Coux, Patricia and Bachelet, R. and Warot-Fonrose, Bénédicte and Skumryev, V. and Lupina, L. and Niu, G. and Schroeder, T. and Fontcuberta, J. and Sánchez, F.},
year = {2014},
pages = {012401},
}
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