Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS. Ding, T., Sigle, D. O., Herrmann, L. O., Wolverson, D., & Baumberg, J. J. ACS Applied Materials & Interfaces, 6(20):17358--17363, October, 2014. ![Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi bibtex @article{ding_nanoimprint_2014,
title = {Nanoimprint {Lithography} of {Al} {Nanovoids} for {Deep}-{UV} {SERS}},
volume = {6},
issn = {1944-8244, 1944-8252},
url = {http://pubs.acs.org/doi/abs/10.1021/am505511v},
doi = {10.1021/am505511v},
language = {en},
number = {20},
urldate = {2015-03-18},
journal = {ACS Applied Materials \& Interfaces},
author = {Ding, Tao and Sigle, Daniel O. and Herrmann, Lars O. and Wolverson, Daniel and Baumberg, Jeremy J.},
month = oct,
year = {2014},
pages = {17358--17363},
file = {Ding et al_2014_Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS.pdf:/Users/baptiste/Library/Application Support/Zotero/Profiles/d9rq1atq.default/zotero/storage/5QXABZGP/Ding et al_2014_Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS.pdf:application/pdf}
}
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