Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS. Ding, T.; Sigle, D. O.; Herrmann, L. O.; Wolverson, D.; and Baumberg, J. J. ACS Applied Materials & Interfaces, 6(20):17358--17363, October, 2014.
Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS [link]Paper  doi  bibtex   
@article{ding_nanoimprint_2014,
	title = {Nanoimprint {Lithography} of {Al} {Nanovoids} for {Deep}-{UV} {SERS}},
	volume = {6},
	issn = {1944-8244, 1944-8252},
	url = {http://pubs.acs.org/doi/abs/10.1021/am505511v},
	doi = {10.1021/am505511v},
	language = {en},
	number = {20},
	urldate = {2015-03-18},
	journal = {ACS Applied Materials \& Interfaces},
	author = {Ding, Tao and Sigle, Daniel O. and Herrmann, Lars O. and Wolverson, Daniel and Baumberg, Jeremy J.},
	month = oct,
	year = {2014},
	pages = {17358--17363},
	file = {Ding et al_2014_Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS.pdf:/Users/baptiste/Library/Application Support/Zotero/Profiles/d9rq1atq.default/zotero/storage/5QXABZGP/Ding et al_2014_Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS.pdf:application/pdf}
}
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