Inelastic H Atom Scattering from Ultrathin Aluminum Oxide Films Grown by Atomic Layer Deposition on Pt(111). Dorenkamp, Y., Volkmann, C., Roddatis, V., Schneider, S., Wodtke, A. M., & Bünermann, O. The Journal of Physical Chemistry C, 122:10096–10102, American Chemical Society (ACS), 2018.
Inelastic H Atom Scattering from Ultrathin Aluminum Oxide Films Grown by Atomic Layer Deposition on Pt(111) [link]Paper  doi  bibtex   
@article{10.1021/acs.jpcc.8b02692,
doi = {10.1021/acs.jpcc.8b02692},
url = {http://dx.doi.org/10.1021/acs.jpcc.8b02692},
year = 2018,
publisher = {American Chemical Society ({ACS})},
volume = {122},
pages = {10096--10102},
author = {Yvonne Dorenkamp and Christian Volkmann and Vladimir Roddatis and Sven Schneider and Alec M. Wodtke and Oliver Bünermann},
title = {Inelastic H Atom Scattering from Ultrathin Aluminum Oxide Films Grown by Atomic Layer Deposition on Pt(111)},
journal = {The Journal of Physical Chemistry C}
}

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