Enhanced resputtering and asymmetric interface mixing in W/Si multilayers. Eberl, C., Liese, T., Schlenkrich, F., Döring, F., Hofsäss, H., & Krebs, H. Applied Physics A, 111:431–437, Springer Nature, 2013.
Enhanced resputtering and asymmetric interface mixing in W/Si multilayers [link]Paper  doi  bibtex   
@article{10.1007/s00339-013-7587-5,
doi = {10.1007/s00339-013-7587-5},
url = {http://dx.doi.org/10.1007/s00339-013-7587-5},
year = 2013,
publisher = {Springer Nature},
volume = {111},
pages = {431--437},
author = {Christian Eberl and Tobias Liese and Felix Schlenkrich and Florian Döring and Hans Hofsäss and Hans-Ulrich Krebs},
title = {Enhanced resputtering and asymmetric interface mixing in W/Si multilayers},
journal = {Applied Physics A}
}

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