QMS: Evaluating the Side-Channel Resistance of Masked Software from Source Code. Eldib, H., Wang, C., Taha, M. M. I., & Schaumont, P. In The 51st Annual Design Automation Conference 2014, DAC '14, San Francisco, CA, USA, June 1-5, 2014, pages 209:1–209:6, 2014. ACM.
QMS: Evaluating the Side-Channel Resistance of Masked Software from Source Code [link]Paper  doi  bibtex   
@inproceedings{DBLP:conf/dac/EldibWTS14,
  author       = {Hassan Eldib and
                  Chao Wang and
                  Mostafa M. I. Taha and
                  Patrick Schaumont},
  title        = {{QMS:} Evaluating the Side-Channel Resistance of Masked Software from
                  Source Code},
  booktitle    = {The 51st Annual Design Automation Conference 2014, {DAC} '14, San
                  Francisco, CA, USA, June 1-5, 2014},
  pages        = {209:1--209:6},
  publisher    = {{ACM}},
  year         = {2014},
  url          = {https://doi.org/10.1145/2593069.2593193},
  doi          = {10.1145/2593069.2593193},
  timestamp    = {Mon, 15 Jun 2020 01:00:00 +0200},
  biburl       = {https://dblp.org/rec/conf/dac/EldibWTS14.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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