QMS: Evaluating the Side-Channel Resistance of Masked Software from Source Code. Eldib, H., Wang, C., Taha, M. M. I., & Schaumont, P. In The 51st Annual Design Automation Conference 2014, DAC '14, San Francisco, CA, USA, June 1-5, 2014, pages 209:1–209:6, 2014. ACM.
Paper doi bibtex @inproceedings{DBLP:conf/dac/EldibWTS14,
author = {Hassan Eldib and
Chao Wang and
Mostafa M. I. Taha and
Patrick Schaumont},
title = {{QMS:} Evaluating the Side-Channel Resistance of Masked Software from
Source Code},
booktitle = {The 51st Annual Design Automation Conference 2014, {DAC} '14, San
Francisco, CA, USA, June 1-5, 2014},
pages = {209:1--209:6},
publisher = {{ACM}},
year = {2014},
url = {https://doi.org/10.1145/2593069.2593193},
doi = {10.1145/2593069.2593193},
timestamp = {Mon, 15 Jun 2020 01:00:00 +0200},
biburl = {https://dblp.org/rec/conf/dac/EldibWTS14.bib},
bibsource = {dblp computer science bibliography, https://dblp.org}
}
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