Microscopically inhomogeneous electronic and material properties arising during thermal and plasma CVD of graphene. Čermák, J., Yamada, T., Ledinský, M., Hasegawa, M., & Rezek, B. Journal of Materials Chemistry C, 2(42):8939--8948, October, 2014. 00001
Paper doi abstract bibtex Graphene layers were prepared on copper substrates by thermal chemical vapor deposition (CVD) and microwave (MW) plasma CVD processes. Atomic force microscopy in topography, phase imaging, and conductivity detection (C-AFM) as well as Raman micro-spectroscopy are employed to analyze the graphene layers on a microscopic scale in an as-deposited state on copper. By correlating these data we identify microscopic inhomogeneities (on a micrometer and nanometer scale) in material and electrical properties of both types of graphene. The inhomogeneities are attributed to (i) large but defects including flakes of plasma CVD graphene and (ii) high quality but small flakes of thermal CVD graphene. Moreover, the plasma CVD graphene contains large density of non-conductive openings (0.1–1 μm in size) where no graphene is detected. The obtained data explain two orders of magnitude lower electrical conductivity of the plasma CVD graphene measured macroscopically after substrate transfer. Implications for optimizing the graphene growth processes are discussed.
@article{ cermak_microscopically_2014,
title = {Microscopically inhomogeneous electronic and material properties arising during thermal and plasma {CVD} of graphene},
volume = {2},
issn = {2050-7534},
url = {http://pubs.rsc.org/en/content/articlelanding/2014/tc/c4tc01818d},
doi = {10.1039/C4TC01818D},
abstract = {Graphene layers were prepared on copper substrates by thermal chemical vapor deposition ({CVD}) and microwave ({MW}) plasma {CVD} processes. Atomic force microscopy in topography, phase imaging, and conductivity detection (C-{AFM}) as well as Raman micro-spectroscopy are employed to analyze the graphene layers on a microscopic scale in an as-deposited state on copper. By correlating these data we identify microscopic inhomogeneities (on a micrometer and nanometer scale) in material and electrical properties of both types of graphene. The inhomogeneities are attributed to (i) large but defects including flakes of plasma {CVD} graphene and (ii) high quality but small flakes of thermal {CVD} graphene. Moreover, the plasma {CVD} graphene contains large density of non-conductive openings (0.1–1 μm in size) where no graphene is detected. The obtained data explain two orders of magnitude lower electrical conductivity of the plasma {CVD} graphene measured macroscopically after substrate transfer. Implications for optimizing the graphene growth processes are discussed.},
language = {en},
number = {42},
urldate = {2015-01-07TZ},
journal = {Journal of Materials Chemistry C},
author = {Čermák, J. and Yamada, T. and Ledinský, M. and Hasegawa, M. and Rezek, B.},
month = {October},
year = {2014},
note = {00001},
pages = {8939--8948}
}
Downloads: 0
{"_id":"KQ8ZhPhgtEbGqJLvw","bibbaseid":"ermk-yamada-ledinsk-hasegawa-rezek-microscopicallyinhomogeneouselectronicandmaterialpropertiesarisingduringthermalandplasmacvdofgraphene-2014","downloads":0,"creationDate":"2015-02-03T19:44:44.059Z","title":"Microscopically inhomogeneous electronic and material properties arising during thermal and plasma CVD of graphene","author_short":["Čermák, J.","Yamada, T.","Ledinský, M.","Hasegawa, M.","Rezek, B."],"year":2014,"bibtype":"article","biburl":"https://api.zotero.org/users/9306/collections/JQW749CI/items?key=56utL422mxibPpzqIPfQYj0t&format=bibtex&limit=100","bibdata":{"abstract":"Graphene layers were prepared on copper substrates by thermal chemical vapor deposition (CVD) and microwave (MW) plasma CVD processes. Atomic force microscopy in topography, phase imaging, and conductivity detection (C-AFM) as well as Raman micro-spectroscopy are employed to analyze the graphene layers on a microscopic scale in an as-deposited state on copper. By correlating these data we identify microscopic inhomogeneities (on a micrometer and nanometer scale) in material and electrical properties of both types of graphene. The inhomogeneities are attributed to (i) large but defects including flakes of plasma CVD graphene and (ii) high quality but small flakes of thermal CVD graphene. Moreover, the plasma CVD graphene contains large density of non-conductive openings (0.1–1 μm in size) where no graphene is detected. The obtained data explain two orders of magnitude lower electrical conductivity of the plasma CVD graphene measured macroscopically after substrate transfer. Implications for optimizing the graphene growth processes are discussed.","author":["Čermák, J.","Yamada, T.","Ledinský, M.","Hasegawa, M.","Rezek, B."],"author_short":["Čermák, J.","Yamada, T.","Ledinský, M.","Hasegawa, M.","Rezek, B."],"bibtex":"@article{ cermak_microscopically_2014,\n title = {Microscopically inhomogeneous electronic and material properties arising during thermal and plasma {CVD} of graphene},\n volume = {2},\n issn = {2050-7534},\n url = {http://pubs.rsc.org/en/content/articlelanding/2014/tc/c4tc01818d},\n doi = {10.1039/C4TC01818D},\n abstract = {Graphene layers were prepared on copper substrates by thermal chemical vapor deposition ({CVD}) and microwave ({MW}) plasma {CVD} processes. Atomic force microscopy in topography, phase imaging, and conductivity detection (C-{AFM}) as well as Raman micro-spectroscopy are employed to analyze the graphene layers on a microscopic scale in an as-deposited state on copper. By correlating these data we identify microscopic inhomogeneities (on a micrometer and nanometer scale) in material and electrical properties of both types of graphene. The inhomogeneities are attributed to (i) large but defects including flakes of plasma {CVD} graphene and (ii) high quality but small flakes of thermal {CVD} graphene. Moreover, the plasma {CVD} graphene contains large density of non-conductive openings (0.1–1 μm in size) where no graphene is detected. The obtained data explain two orders of magnitude lower electrical conductivity of the plasma {CVD} graphene measured macroscopically after substrate transfer. Implications for optimizing the graphene growth processes are discussed.},\n language = {en},\n number = {42},\n urldate = {2015-01-07TZ},\n journal = {Journal of Materials Chemistry C},\n author = {Čermák, J. and Yamada, T. and Ledinský, M. and Hasegawa, M. and Rezek, B.},\n month = {October},\n year = {2014},\n note = {00001},\n pages = {8939--8948}\n}","bibtype":"article","doi":"10.1039/C4TC01818D","id":"cermak_microscopically_2014","issn":"2050-7534","journal":"Journal of Materials Chemistry C","key":"cermak_microscopically_2014","language":"en","month":"October","note":"00001","number":"42","pages":"8939--8948","title":"Microscopically inhomogeneous electronic and material properties arising during thermal and plasma CVD of graphene","type":"article","url":"http://pubs.rsc.org/en/content/articlelanding/2014/tc/c4tc01818d","urldate":"2015-01-07TZ","volume":"2","year":"2014","bibbaseid":"ermk-yamada-ledinsk-hasegawa-rezek-microscopicallyinhomogeneouselectronicandmaterialpropertiesarisingduringthermalandplasmacvdofgraphene-2014","role":"author","urls":{"Paper":"http://pubs.rsc.org/en/content/articlelanding/2014/tc/c4tc01818d"},"downloads":0},"search_terms":["microscopically","inhomogeneous","electronic","material","properties","arising","during","thermal","plasma","cvd","graphene","čermák","yamada","ledinský","hasegawa","rezek"],"keywords":[],"authorIDs":[],"dataSources":["WPnZAo8YwWpk4So4c"]}