Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges. Fanelli, F. & Fracassi, F. Plasma Processes and Polymers, 13(4):470-479, Wiley-VCH Verlag, 2016. cited By 8![Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi abstract bibtex Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions. Fluorocarbon coatings are deposited on open-cell polyurethane foams using an atmospheric pressure dielectric barrier discharge fed with helium and hexafluoropropene. The discharge is ignited both outside and inside the three-dimensional porous structure of the foam, so that thin film deposition can be achieved on both its outer and inner surfaces. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
@ARTICLE{Fanelli2016470,
author={Fanelli, F. and Fracassi, F.},
title={Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges},
journal={Plasma Processes and Polymers},
year={2016},
volume={13},
number={4},
pages={470-479},
doi={10.1002/ppap.201500150},
note={cited By 8},
url={https://www.scopus.com/inward/record.uri?eid=2-s2.0-84947967727&doi=10.1002%2fppap.201500150&partnerID=40&md5=b43807c0087fe203e5933041587c61d2},
abstract={Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions. Fluorocarbon coatings are deposited on open-cell polyurethane foams using an atmospheric pressure dielectric barrier discharge fed with helium and hexafluoropropene. The discharge is ignited both outside and inside the three-dimensional porous structure of the foam, so that thin film deposition can be achieved on both its outer and inner surfaces. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.},
publisher={Wiley-VCH Verlag},
issn={16128850},
document_type={Article},
source={Scopus},
}
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{"_id":"PvAtsnKN23jGfe768","bibbaseid":"fanelli-fracassi-thinfilmdepositiononopencellfoamsbyatmosphericpressuredielectricbarrierdischarges-2016","authorIDs":[],"author_short":["Fanelli, F.","Fracassi, F."],"bibdata":{"bibtype":"article","type":"article","author":[{"propositions":[],"lastnames":["Fanelli"],"firstnames":["F."],"suffixes":[]},{"propositions":[],"lastnames":["Fracassi"],"firstnames":["F."],"suffixes":[]}],"title":"Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges","journal":"Plasma Processes and Polymers","year":"2016","volume":"13","number":"4","pages":"470-479","doi":"10.1002/ppap.201500150","note":"cited By 8","url":"https://www.scopus.com/inward/record.uri?eid=2-s2.0-84947967727&doi=10.1002%2fppap.201500150&partnerID=40&md5=b43807c0087fe203e5933041587c61d2","abstract":"Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions. Fluorocarbon coatings are deposited on open-cell polyurethane foams using an atmospheric pressure dielectric barrier discharge fed with helium and hexafluoropropene. The discharge is ignited both outside and inside the three-dimensional porous structure of the foam, so that thin film deposition can be achieved on both its outer and inner surfaces. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.","publisher":"Wiley-VCH Verlag","issn":"16128850","document_type":"Article","source":"Scopus","bibtex":"@ARTICLE{Fanelli2016470,\nauthor={Fanelli, F. and Fracassi, F.},\ntitle={Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges},\njournal={Plasma Processes and Polymers},\nyear={2016},\nvolume={13},\nnumber={4},\npages={470-479},\ndoi={10.1002/ppap.201500150},\nnote={cited By 8},\nurl={https://www.scopus.com/inward/record.uri?eid=2-s2.0-84947967727&doi=10.1002%2fppap.201500150&partnerID=40&md5=b43807c0087fe203e5933041587c61d2},\nabstract={Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions. Fluorocarbon coatings are deposited on open-cell polyurethane foams using an atmospheric pressure dielectric barrier discharge fed with helium and hexafluoropropene. The discharge is ignited both outside and inside the three-dimensional porous structure of the foam, so that thin film deposition can be achieved on both its outer and inner surfaces. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.},\npublisher={Wiley-VCH Verlag},\nissn={16128850},\ndocument_type={Article},\nsource={Scopus},\n}\n\n","author_short":["Fanelli, F.","Fracassi, F."],"key":"Fanelli2016470","id":"Fanelli2016470","bibbaseid":"fanelli-fracassi-thinfilmdepositiononopencellfoamsbyatmosphericpressuredielectricbarrierdischarges-2016","role":"author","urls":{"Paper":"https://www.scopus.com/inward/record.uri?eid=2-s2.0-84947967727&doi=10.1002%2fppap.201500150&partnerID=40&md5=b43807c0087fe203e5933041587c61d2"},"metadata":{"authorlinks":{}},"downloads":0},"bibtype":"article","biburl":"http://nanotec.cnr.it/data/nanotec/scopus-2016.bib","creationDate":"2020-04-27T18:01:52.195Z","downloads":0,"keywords":[],"search_terms":["thin","film","deposition","open","cell","foams","atmospheric","pressure","dielectric","barrier","discharges","fanelli","fracassi"],"title":"Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges","year":2016,"dataSources":["XkJQtp3XfFGBsyPm2","TgRzGSnFk8ZF7cwa2","4HpqF5sP8mEaFKLQ5"]}