Synthesis–structure relations for reactive magnetron sputtered V2O5 films. Fateh, N., Fontalvo, G., Cha, L., Klünsner, T., Hlawacek, G., Teichert, C., & Mitterer, C. Surface and Coatings Technology, 202(8):1551-1555, 1, 2008.
Synthesis–structure relations for reactive magnetron sputtered V2O5 films [pdf]Paper  Synthesis–structure relations for reactive magnetron sputtered V2O5 films [link]Website  abstract   bibtex   
V2O5 films were grown onto MgO (100) substrates by reactive magnetron sputtering between 26 °C to 300 °C to establish a detailed synthesis–structure relation. The effect of deposition temperature on structural characteristics and surface morphology was characterized using X- ray diffraction, Raman spectroscopy, atomic force microscopy and scanning and transmission electron microscopy. Films prepared at room temperature are amorphous while those deposited above 80 °C exhibit a polycrystalline structure with the orthorhombic symmetry of the V2O5 phase.
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 title = {Synthesis–structure relations for reactive magnetron sputtered V2O5 films},
 type = {article},
 year = {2008},
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 pages = {1551-1555},
 volume = {202},
 websites = {http://linkinghub.elsevier.com/retrieve/pii/S0257897207007153},
 month = {1},
 day = {15},
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 last_modified = {2017-03-10T15:48:51.694Z},
 tags = {100,afm,article,crystalline,ffm,friction,friction_coefficient,magnesium,oxide,raman-spectroscopy,sem,tem,thin-film,vanadium},
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 abstract = {V2O5 films were grown onto MgO (100) substrates by reactive magnetron sputtering between 26 °C to 300 °C to establish a detailed synthesis–structure relation. The effect of deposition temperature on structural characteristics and surface morphology was characterized using X- ray diffraction, Raman spectroscopy, atomic force microscopy and scanning and transmission electron microscopy. Films prepared at room temperature are amorphous while those deposited above 80 °C exhibit a polycrystalline structure with the orthorhombic symmetry of the V2O5 phase.},
 bibtype = {article},
 author = {Fateh, N. and Fontalvo, G.A. and Cha, L. and Klünsner, T. and Hlawacek, Gregor and Teichert, Christian and Mitterer, C.},
 journal = {Surface and Coatings Technology},
 number = {8}
}
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