Synthesis–structure relations for reactive magnetron sputtered V2O5 films. Fateh, N., Fontalvo, G., Cha, L., Klünsner, T., Hlawacek, G., Teichert, C., & Mitterer, C. Surface and Coatings Technology, 202(8):1551-1555, 1, 2008. Paper Website abstract bibtex V2O5 films were grown onto MgO (100) substrates by reactive magnetron sputtering between 26 °C to 300 °C to establish a detailed synthesis–structure relation. The effect of deposition temperature on structural characteristics and surface morphology was characterized using X- ray diffraction, Raman spectroscopy, atomic force microscopy and scanning and transmission electron microscopy. Films prepared at room temperature are amorphous while those deposited above 80 °C exhibit a polycrystalline structure with the orthorhombic symmetry of the V2O5 phase.
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title = {Synthesis–structure relations for reactive magnetron sputtered V2O5 films},
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abstract = {V2O5 films were grown onto MgO (100) substrates by reactive magnetron sputtering between 26 °C to 300 °C to establish a detailed synthesis–structure relation. The effect of deposition temperature on structural characteristics and surface morphology was characterized using X- ray diffraction, Raman spectroscopy, atomic force microscopy and scanning and transmission electron microscopy. Films prepared at room temperature are amorphous while those deposited above 80 °C exhibit a polycrystalline structure with the orthorhombic symmetry of the V2O5 phase.},
bibtype = {article},
author = {Fateh, N. and Fontalvo, G.A. and Cha, L. and Klünsner, T. and Hlawacek, Gregor and Teichert, Christian and Mitterer, C.},
journal = {Surface and Coatings Technology},
number = {8}
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