@article{
 title = {Nanoimprint lithography of deoxyribonucleic acid biopolymer films},
 type = {article},
 year = {2013},
 identifiers = {[object Object]},
 keywords = {[deoxyribonucleic acid biopolymer,inverted ridge},
 pages = {040501},
 volume = {12},
 websites = {http://nanolithography.spiedigitallibrary.org/article.aspx?doi=10.1117/1.JMM.12.4.040501},
 month = {12},
 day = {16},
 id = {9b752889-bd97-3fdb-bbcc-b8898658584f},
 created = {2016-11-29T20:08:40.000Z},
 file_attached = {true},
 profile_id = {5acf7219-b273-3347-86fe-f10431efdf1c},
 last_modified = {2017-03-15T05:32:43.172Z},
 read = {false},
 starred = {false},
 authored = {true},
 confirmed = {true},
 hidden = {false},
 citation_key = {FehrmanCory2013},
 private_publication = {false},
 abstract = {Thermal nanoimprint lithography (NIL) is presented as an alternative fabrication technique for patterning deoxyribonucleic acid (DNA) biopolymer films for photonic device applications. The techniques and procedures developed for directly imprinting optical waveguide structures on a DNA biopolymer using NIL, bypassing the use of a resist layer and any chemical processing, are outlined here. The fabrication technique was developed with a Nanonex NX-2600 NIL flexible membrane system. Additionally, a process for using a Suss MicroTec ELAN CB6L substrate bonder is discussed as an alternative to commercially available NIL systems. © The Authors.},
 bibtype = {article},
 author = {Fehrman Cory, Emily M. and Aga, Roberto S. and Lombardi, Jack P. and Bartsch, Carrie M. and Sarangan, Andrew and Heckman, Emily M.},
 journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
 number = {4}
}

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