@article{feibelman_surface-diffusion_2001,
	title = {Surface-diffusion mechanism versus electric field: {Pt}/{Pt}(001)},
	volume = {64},
	shorttitle = {Surface-diffusion mechanism versus electric field},
	url = {http://link.aps.org/doi/10.1103/PhysRevB.64.125403},
	doi = {10.1103/PhysRevB.64.125403},
	abstract = {Ab initio calculations agree with field ion microscopy (FIM) that the barrier to substitutional diffusion of a Pt atom on Pt(001) varies linearly with external electric field, changing ∼0.1 eV per V/Å and increasing for fields oriented to push electrons into the surface. But with a computed hopping barrier remaining {\textgreater}0.5 eV higher than that for substitution, they contradict the idea that a change in FIM site visitation at fields of 1.5–2 V/Å and temperatures ∼265–284 K can be attributed to the onset of hopping.},
	number = {12},
	urldate = {2015-05-08},
	journal = {Physical Review B},
	author = {Feibelman, Peter J.},
	month = sep,
	year = {2001},
	keywords = {EFIELD, electric field, implementation, vasp},
	pages = {125403},
}

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