Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD. Ferro, G., Chubarov, M., Mercier, F., Lay, S., Charlot, F., Crisci, A., Coindeau, S., Encinas, T., Reboud, R., & Boichot, R. Thin Solid Films, 623:65 - 71, Elsevier, 2017. Paper doi bibtex @article{ferro_2017_j.tsf.2016.11.045,
author = {G. Ferro and M. Chubarov and F. Mercier and S. Lay and F. Charlot and A. Crisci and S. Coindeau and T. Encinas and R. Reboud and R. Boichot},
doi = {10.1016/j.tsf.2016.11.045},
journal = {Thin Solid Films},
pages = {65 - 71},
publisher = {{Elsevier}},
title = {Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD},
url = {https://hal.archives-ouvertes.fr/hal-01615193},
volume = {623},
year = {2017},
number = {},
booktitle = {},
}
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