17.2 A 64kb 16nm asynchronous disturb current free 2-port SRAM with PMOS pass-gates for FinFET technologies. Fujiwara, H., Wang, L., Chen, Y., Lin, K., Sun, D., Wu, S., Liaw, J., Lin, C., Chiang, M., Liao, H., Wu, S., & Chang, J. In ISSCC, pages 1-3, 2015. IEEE. Link Paper bibtex @inproceedings{conf/isscc/FujiwaraWCLSWLL15,
added-at = {2015-03-24T00:00:00.000+0100},
author = {Fujiwara, Hidehiro and Wang, Li-Wen and Chen, Yen-Huei and Lin, Kao-Cheng and Sun, Dar and Wu, Shin-Rung and Liaw, Jhon-Jhy and Lin, Chih-Yung and Chiang, Mu-Chi and Liao, Hung-Jen and Wu, Shien-Yang and Chang, Jonathan},
biburl = {http://www.bibsonomy.org/bibtex/2a9a2f713aa938422e63e5d3c08e08869/dblp},
booktitle = {ISSCC},
crossref = {conf/isscc/2015},
ee = {http://dx.doi.org/10.1109/ISSCC.2015.7063051},
interhash = {ec2a5b8c161a6237ecbd0a5c696d525b},
intrahash = {a9a2f713aa938422e63e5d3c08e08869},
isbn = {978-1-4799-6224-2},
keywords = {dblp},
pages = {1-3},
publisher = {IEEE},
timestamp = {2015-06-18T16:09:38.000+0200},
title = {17.2 A 64kb 16nm asynchronous disturb current free 2-port SRAM with PMOS pass-gates for FinFET technologies.},
url = {http://dblp.uni-trier.de/db/conf/isscc/isscc2015.html#FujiwaraWCLSWLL15},
year = 2015
}
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