Crystallographic effects in modeling fundamental behavior of MEMS silicon resonators. Ghaffari, S., Ahn, C. H., Ng, E. J., Wang, S., & Kenny, T. W. Microelectron. J., 44(7):586-591, 2013.
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Paper bibtex @article{journals/mj/GhaffariANWK13,
added-at = {2020-02-22T00:00:00.000+0100},
author = {Ghaffari, Shirin and Ahn, Chae H. and Ng, Eldwin J. and Wang, Shasha and Kenny, Thomas W.},
biburl = {https://www.bibsonomy.org/bibtex/2079c0fb35d24f5425268fafbe0a5507f/dblp},
ee = {https://doi.org/10.1016/j.mejo.2013.03.010},
interhash = {941407eb75799fcee6d8370f4c24f34c},
intrahash = {079c0fb35d24f5425268fafbe0a5507f},
journal = {Microelectron. J.},
keywords = {dblp},
number = 7,
pages = {586-591},
timestamp = {2020-02-25T13:00:42.000+0100},
title = {Crystallographic effects in modeling fundamental behavior of MEMS silicon resonators.},
url = {http://dblp.uni-trier.de/db/journals/mj/mj44.html#GhaffariANWK13},
volume = 44,
year = 2013
}
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