@article{Grigoras2009,
   abstract = {Nanoporous anodic alumina membranes and silicon samples with plasma etched nanopores have been coated with zinc oxide or gold layer using atomic layer deposition (ALD) or sputtering, respectively. In the case of ALD process, the precursor pulses were extended, compared with planar substrate coating. Thick (60 microm) anodic alumina membranes have been conformally coated with zinc oxide ALD layer. Metal sputtering technique was used just for opposite purpose--to minimize the penetration of gold into the pores during gold-coating of the top and bottom surfaces of the membrane. Scanning electron microscopy (SEM) has been used to investigate the layer thickness, uniformity and conformality inside the nanopores.},
   author = {N. K. Grigoras and V. M. Airaksinen and S. Franssila},
   doi = {10.1166/jnn.2009.NS64},
   issn = {15334880},
   issue = {6},
   journal = {Journal of Nanoscience and Nanotechnology},
   keywords = {ALD,Anodic alumina membrane,Conformal coating,SEM.},
   pages = {3763-3770},
   title = {Coating of nanoporous membranes: Atomic layer deposition versus sputtering},
   volume = {9},
   year = {2009},
}

{"_id":"T6nJR4iAR59ofotCy","bibbaseid":"grigoras-airaksinen-franssila-coatingofnanoporousmembranesatomiclayerdepositionversussputtering-2009","author_short":["Grigoras, N. K.","Airaksinen, V. M.","Franssila, S."],"bibdata":{"bibtype":"article","type":"article","abstract":"Nanoporous anodic alumina membranes and silicon samples with plasma etched nanopores have been coated with zinc oxide or gold layer using atomic layer deposition (ALD) or sputtering, respectively. In the case of ALD process, the precursor pulses were extended, compared with planar substrate coating. Thick (60 microm) anodic alumina membranes have been conformally coated with zinc oxide ALD layer. Metal sputtering technique was used just for opposite purpose–to minimize the penetration of gold into the pores during gold-coating of the top and bottom surfaces of the membrane. Scanning electron microscopy (SEM) has been used to investigate the layer thickness, uniformity and conformality inside the nanopores.","author":[{"firstnames":["N.","K."],"propositions":[],"lastnames":["Grigoras"],"suffixes":[]},{"firstnames":["V.","M."],"propositions":[],"lastnames":["Airaksinen"],"suffixes":[]},{"firstnames":["S."],"propositions":[],"lastnames":["Franssila"],"suffixes":[]}],"doi":"10.1166/jnn.2009.NS64","issn":"15334880","issue":"6","journal":"Journal of Nanoscience and Nanotechnology","keywords":"ALD,Anodic alumina membrane,Conformal coating,SEM.","pages":"3763-3770","title":"Coating of nanoporous membranes: Atomic layer deposition versus sputtering","volume":"9","year":"2009","bibtex":"@article{Grigoras2009,\n abstract = {Nanoporous anodic alumina membranes and silicon samples with plasma etched nanopores have been coated with zinc oxide or gold layer using atomic layer deposition (ALD) or sputtering, respectively. In the case of ALD process, the precursor pulses were extended, compared with planar substrate coating. Thick (60 microm) anodic alumina membranes have been conformally coated with zinc oxide ALD layer. Metal sputtering technique was used just for opposite purpose--to minimize the penetration of gold into the pores during gold-coating of the top and bottom surfaces of the membrane. Scanning electron microscopy (SEM) has been used to investigate the layer thickness, uniformity and conformality inside the nanopores.},\n author = {N. K. Grigoras and V. M. Airaksinen and S. Franssila},\n doi = {10.1166/jnn.2009.NS64},\n issn = {15334880},\n issue = {6},\n journal = {Journal of Nanoscience and Nanotechnology},\n keywords = {ALD,Anodic alumina membrane,Conformal coating,SEM.},\n pages = {3763-3770},\n title = {Coating of nanoporous membranes: Atomic layer deposition versus sputtering},\n volume = {9},\n year = {2009},\n}\n","author_short":["Grigoras, N. K.","Airaksinen, V. M.","Franssila, S."],"key":"Grigoras2009","id":"Grigoras2009","bibbaseid":"grigoras-airaksinen-franssila-coatingofnanoporousmembranesatomiclayerdepositionversussputtering-2009","role":"author","urls":{},"keyword":["ALD","Anodic alumina membrane","Conformal coating","SEM."],"metadata":{"authorlinks":{}}},"bibtype":"article","biburl":"https://bibbase.org/network/files/QJd5jTh3GMYoFC2sK","dataSources":["afFrdSdmsNikJWZNM","4xtXLpDtLSJKq7xty","DP64ZrtM83gwGq5AX","wCoBgCttwnttTBsce"],"keywords":["ald","anodic alumina membrane","conformal coating","sem."],"search_terms":["coating","nanoporous","membranes","atomic","layer","deposition","versus","sputtering","grigoras","airaksinen","franssila"],"title":"Coating of nanoporous membranes: Atomic layer deposition versus sputtering","year":2009}