@article{Hlawacek2014,
abstract = {Helium Ion Microcopy (HIM) based on Gas Field Ion Sources (GFIS) represents a new ultra high resolution microscopy and nano-fabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nano-structures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gases such as Neon. A brief introduction of the underlying physics as well as a broad review of the applicability of the method is presented in this review.},
author = {Hlawacek, Gregor and Veligura, Vasilisa and van Gastel, Raoul and Poelsema, Bene},
journal = {J. Vac. Sci. Technol. B},
doi = {10.1116/1.4863676},
file = {:D$\backslash$:/DATA/Publications/J. Vac. Sci. Technol. B/Hlawacek et al. - Helium Ion Microscopy - J. Vac. Sci. Technol. B - 2014.pdf:pdf},
mendeley-groups = {2dmp},
number = {2},
title = {{Helium Ion Microscopy}},
volume = {32},
year = {2014}
}

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