Helium ion microscopy

Helium ion microscopy. Hlawacek, G., Veligura, V., van Gastel, R., & Poelsema, B. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 32(2):020801, 3, 2014.

Paper

Website abstract bibtex

Helium Ion Microcopy (HIM) based on Gas Field Ion Sources (GFIS) represents a new ultra high resolution microscopy and nano-fabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nano-structures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gases such as Neon. A brief introduction of the underlying physics as well as a broad review of the applicability of the method is presented in this review.

@article{
 title = {Helium ion microscopy},
 type = {article},
 year = {2014},
 identifiers = {[object Object]},
 pages = {020801},
 volume = {32},
 websites = {http://scitation.aip.org/content/avs/journal/jvstb/32/2/10.1116/1.4863676},
 month = {3},
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 created = {2013-11-08T03:46:36.000Z},
 accessed = {2014-07-21},
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 citation_key = {Hlawacek2013c},
 notes = {<b>From Duplicate 2 ( </b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><b><br/><br/><br/></b><br/><b><br/><i>Helium ion microscopy</i><br/></b><br/><b><br/><br/><br/></b><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><b>- Hlawacek, Gregor; Veligura, Vasilisa; van Gastel, Raoul; Poelsema, Bene )<br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><b>From Duplicate 2 ( </b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><b><br/><br/><br/></b><br/><b><br/><i>Helium Ion Microscopy</i><br/></b><br/><b><br/><br/><br/></b><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><b>- Hlawacek, Gregor; Veligura, Vasilisa; Gastel, Raoul Van; Poelsema, Bene )<br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/></b><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/><br/>invited review; submitted to J. Vac. Sci. Tech. B},
 abstract = {Helium Ion Microcopy (HIM) based on Gas Field Ion Sources (GFIS) represents a new ultra high resolution microscopy and nano-fabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nano-structures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gases such as Neon. A brief introduction of the underlying physics as well as a broad review of the applicability of the method is presented in this review.},
 bibtype = {article},
 author = {Hlawacek, Gregor and Veligura, Vasilisa and van Gastel, Raoul and Poelsema, Bene},
 journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures},
 number = {2}
}

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