Atomic scale structure and chemistry of Bi2Te3/GaAs interfaces grown by metallorganic van der Waals epitaxy. Houston Dycus, J, White, R. M, Pierce, J. M, Venkatasubramanian, R., & LeBeau, J. M Appl. Phys. Lett., 102:081601, American Institute of Physics, 25 February, 2013.
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@ARTICLE{Houston-Dycus2013-bn,
  title     = "{Atomic scale structure and chemistry of Bi2Te3/GaAs interfaces
               grown by metallorganic van der Waals epitaxy}",
  author    = "Houston Dycus, J and White, Ryan M and Pierce, Jonathan M and
               Venkatasubramanian, Rama and LeBeau, James M",
  journal   = "Appl. Phys. Lett.",
  publisher = "American Institute of Physics",
  volume    =  102,
  pages     =  081601,
  month     =  "25~" # feb,
  year      =  2013,
  keywords  = "6835Ct; 6847Fg; 6855ag; 7155Eq; 8115Gh; 8115Kk; III-V
               semiconductors; MOCVD; bismuth compounds; dangling bonds; gallium
               arsenide; interface structure; scanning-transmission electron
               microscopy; semiconductor epitaxial layers; semiconductor growth;
               semiconductor materials; vapour phase epitaxial growth;LeBeau
               Group;HfO2",
  doi       = "10.1063/1.4793518"
}

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