@inproceedings{Hsieh2012ICIDM,
  title={An Effective Scheduling and Dispatching Approach for Cycle Time Reduction in Semiconductor
  Manufacturing},
  abstract={In semiconductor manufacturing, Photolithography is one of the most influential stations to the overall product cycle time. In this paper, we propose an effective scheduling and dispatching (S&D) approach to improve the production efficiency in Photolithography. An empirical study was conducted to demonstrate the effectiveness of proposed S&D method. Results showed that the cycle time in Photolithography is significantly improved due to the proposed S&D approach. Compared to the current practice, the proposed S\&D approach can reduce the mean cycle time by 7\% and 10\%},
  author={Liam Y. Hsieh and Kuo-Hao Chang and Chen-Fu Chien and Li-Yuan Yen},
  booktitle={International Conference on Innovative Design and Manufacturing 2012 (ICIDM 2012)},
  year={2012}
}

{"_id":"F27RRWSGEzZXeYPWC","bibbaseid":"hsieh-chang-chien-yen-aneffectiveschedulinganddispatchingapproachforcycletimereductioninsemiconductormanufacturing-2012","author_short":["Hsieh, L. Y.","Chang, K.","Chien, C.","Yen, L."],"bibdata":{"bibtype":"inproceedings","type":"inproceedings","title":"An Effective Scheduling and Dispatching Approach for Cycle Time Reduction in Semiconductor Manufacturing","abstract":"In semiconductor manufacturing, Photolithography is one of the most influential stations to the overall product cycle time. In this paper, we propose an effective scheduling and dispatching (S&D) approach to improve the production efficiency in Photolithography. An empirical study was conducted to demonstrate the effectiveness of proposed S&D method. Results showed that the cycle time in Photolithography is significantly improved due to the proposed S&D approach. Compared to the current practice, the proposed S&D approach can reduce the mean cycle time by 7% and 10%","author":[{"firstnames":["Liam","Y."],"propositions":[],"lastnames":["Hsieh"],"suffixes":[]},{"firstnames":["Kuo-Hao"],"propositions":[],"lastnames":["Chang"],"suffixes":[]},{"firstnames":["Chen-Fu"],"propositions":[],"lastnames":["Chien"],"suffixes":[]},{"firstnames":["Li-Yuan"],"propositions":[],"lastnames":["Yen"],"suffixes":[]}],"booktitle":"International Conference on Innovative Design and Manufacturing 2012 (ICIDM 2012)","year":"2012","bibtex":"@inproceedings{Hsieh2012ICIDM,\r\n title={An Effective Scheduling and Dispatching Approach for Cycle Time Reduction in Semiconductor\r\n Manufacturing},\r\n abstract={In semiconductor manufacturing, Photolithography is one of the most influential stations to the overall product cycle time. In this paper, we propose an effective scheduling and dispatching (S&D) approach to improve the production efficiency in Photolithography. An empirical study was conducted to demonstrate the effectiveness of proposed S&D method. Results showed that the cycle time in Photolithography is significantly improved due to the proposed S&D approach. Compared to the current practice, the proposed S\\&D approach can reduce the mean cycle time by 7\\% and 10\\%},\r\n author={Liam Y. Hsieh and Kuo-Hao Chang and Chen-Fu Chien and Li-Yuan Yen},\r\n booktitle={International Conference on Innovative Design and Manufacturing 2012 (ICIDM 2012)},\r\n year={2012}\r\n}\r\n\r\n","author_short":["Hsieh, L. Y.","Chang, K.","Chien, C.","Yen, L."],"key":"Hsieh2012ICIDM","id":"Hsieh2012ICIDM","bibbaseid":"hsieh-chang-chien-yen-aneffectiveschedulinganddispatchingapproachforcycletimereductioninsemiconductormanufacturing-2012","role":"author","urls":{},"metadata":{"authorlinks":{}}},"bibtype":"inproceedings","biburl":"https://liamhsieh.info/assets/Liam.bib","dataSources":["XuF7cbWQ7pWcthfTE"],"keywords":[],"search_terms":["effective","scheduling","dispatching","approach","cycle","time","reduction","semiconductor","manufacturing","hsieh","chang","chien","yen"],"title":"An Effective Scheduling and Dispatching Approach for Cycle Time Reduction in Semiconductor Manufacturing","year":2012}