@article{jensen_heavy_2008,
	title = {Heavy ion beam-based nano- and micro-structuring of {TiO}2 single crystals using self-assembled masks},
	volume = {266},
	issn = {0168-583X},
	url = {http://www.sciencedirect.com/science/article/B6TJN-4S6G8W4-1/2/952bb2cad3c6b2b732950a07ffb853b3},
	doi = {10.1016/j.nimb.2008.03.220},
	abstract = {Fast heavy ion beam-based lithography using masks of self-assembled materials has been applied for transferring well-ordered nano- and micropatterns to rutile TiO2 single crystals. As the induced damage has a high etching selectivity the patterns can be developed in hydrofluoric acid with very high-contrast. Here we present resulting patterns when using a mask of self-ordered silica spheres. The obtained pattern are replicas of the mass distribution of the mask. In addition the shape and size of the regular structures depend on the applied ion energy and fluence. Direct modifications of the optical properties of TiO2 in a well-defined pattern are also presented.},
	number = {12-13},
	urldate = {2009-01-08TZ},
	journal = {Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms},
	author = {Jensen, J. and Skupinski, M. and Hjort, K. and Sanz, R.},
	month = jun,
	year = {2008},
	keywords = {Colloidal mask, Ion lithography, Ion tracks, Nanopatterning, TiO2},
	pages = {3113--3119}
}

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