Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors. Jiang, W., Zhang, Y., & Bogaerts, A. New Journal of Physics, 16(11):113036, 2014. abstract bibtex In metallized film capacitors, there exists an air gap of about 0.2 mu m between the films, with a pressure ranging generally from 1-30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 mu m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (similar to 15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (similar to 50 V). At still higher applied voltage (similar to 100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.
@article{
title = {Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors},
type = {article},
year = {2014},
identifiers = {[object Object]},
keywords = {Metallized film capacitors,Micro plasma,Particle in cell},
pages = {113036},
volume = {16},
id = {83b0e36c-83b0-3a17-8d59-9cc8e8f4e8aa},
created = {2018-02-01T06:49:43.262Z},
file_attached = {false},
profile_id = {1a73be13-27f1-3556-95c5-66a76ed8d326},
last_modified = {2018-02-01T06:49:43.262Z},
read = {false},
starred = {false},
authored = {true},
confirmed = {true},
hidden = {false},
citation_key = {Jiang2014},
source_type = {article},
private_publication = {false},
abstract = {In metallized film capacitors, there exists an air gap of about 0.2 mu m between the films, with a pressure ranging generally from 1-30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 mu m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (similar to 15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (similar to 50 V). At still higher applied voltage (similar to 100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.},
bibtype = {article},
author = {Jiang, Wei and Zhang, Ya and Bogaerts, Annemie},
journal = {New Journal of Physics},
number = {11}
}
Downloads: 0
{"_id":"gCWQbP3hHidrraJH4","bibbaseid":"jiang-zhang-bogaerts-numericalcharacterizationoflocalelectricalbreakdowninsubmicrometermetallizedfilmcapacitors-2014","downloads":0,"creationDate":"2018-02-01T07:17:45.871Z","title":"Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors","author_short":["Jiang, W.","Zhang, Y.","Bogaerts, A."],"year":2014,"bibtype":"article","biburl":null,"bibdata":{"title":"Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors","type":"article","year":"2014","identifiers":"[object Object]","keywords":"Metallized film capacitors,Micro plasma,Particle in cell","pages":"113036","volume":"16","id":"83b0e36c-83b0-3a17-8d59-9cc8e8f4e8aa","created":"2018-02-01T06:49:43.262Z","file_attached":false,"profile_id":"1a73be13-27f1-3556-95c5-66a76ed8d326","last_modified":"2018-02-01T06:49:43.262Z","read":false,"starred":false,"authored":"true","confirmed":"true","hidden":false,"citation_key":"Jiang2014","source_type":"article","private_publication":false,"abstract":"In metallized film capacitors, there exists an air gap of about 0.2 mu m between the films, with a pressure ranging generally from 1-30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 mu m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (similar to 15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (similar to 50 V). At still higher applied voltage (similar to 100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.","bibtype":"article","author":"Jiang, Wei and Zhang, Ya and Bogaerts, Annemie","journal":"New Journal of Physics","number":"11","bibtex":"@article{\n title = {Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors},\n type = {article},\n year = {2014},\n identifiers = {[object Object]},\n keywords = {Metallized film capacitors,Micro plasma,Particle in cell},\n pages = {113036},\n volume = {16},\n id = {83b0e36c-83b0-3a17-8d59-9cc8e8f4e8aa},\n created = {2018-02-01T06:49:43.262Z},\n file_attached = {false},\n profile_id = {1a73be13-27f1-3556-95c5-66a76ed8d326},\n last_modified = {2018-02-01T06:49:43.262Z},\n read = {false},\n starred = {false},\n authored = {true},\n confirmed = {true},\n hidden = {false},\n citation_key = {Jiang2014},\n source_type = {article},\n private_publication = {false},\n abstract = {In metallized film capacitors, there exists an air gap of about 0.2 mu m between the films, with a pressure ranging generally from 1-30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 mu m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (similar to 15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (similar to 50 V). At still higher applied voltage (similar to 100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.},\n bibtype = {article},\n author = {Jiang, Wei and Zhang, Ya and Bogaerts, Annemie},\n journal = {New Journal of Physics},\n number = {11}\n}","author_short":["Jiang, W.","Zhang, Y.","Bogaerts, A."],"bibbaseid":"jiang-zhang-bogaerts-numericalcharacterizationoflocalelectricalbreakdowninsubmicrometermetallizedfilmcapacitors-2014","role":"author","urls":{},"keyword":["Metallized film capacitors","Micro plasma","Particle in cell"],"downloads":0},"search_terms":["numerical","characterization","local","electrical","breakdown","sub","micrometer","metallized","film","capacitors","jiang","zhang","bogaerts"],"keywords":["metallized film capacitors","micro plasma","particle in cell"],"authorIDs":["5a728ee3f72dbcd631000025","5a72dd642115cfb436000025"]}