A brief review of atomic layer deposition: from fundamentals to applications. Johnson, R. W, Hultqvist, A., & Bent, S. F Materials Today, 17(5):236–246, 2014. bibtex*\'bdsk-file-1':'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'\doi bibtex @article{Johnson2014a,
title = {A brief review of atomic layer deposition: from fundamentals to applications},
volume = {17},
doi = {10.1016/j.mattod.2014.04.026},
number = {5},
journal = {Materials Today},
author = {Johnson, Richard W and Hultqvist, Adam and Bent, Stacey F},
year = {2014},
note = {bibtex*\{'bdsk-file-1':'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'\}},
keywords = {ALD},
pages = {236--246}
}
Downloads: 0
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