Analysis and optimization of SRAM robustness for double patterning lithography. Joshi, V., Agarwal, K., Blaauw, D., & Sylvester, D. In Scheffer, L., Phillips, J. R., & Hu, A. J., editors, ICCAD, pages 25-31, 2010. IEEE.
Analysis and optimization of SRAM robustness for double patterning lithography. [link]Link  Analysis and optimization of SRAM robustness for double patterning lithography. [link]Paper  bibtex   
@inproceedings{conf/iccad/JoshiABS10,
  added-at = {2015-04-30T00:00:00.000+0200},
  author = {Joshi, Vivek and Agarwal, Kanak and Blaauw, David and Sylvester, Dennis},
  biburl = {http://www.bibsonomy.org/bibtex/2677569641ae0305a7e4c8c34451ae3f7/dblp},
  booktitle = {ICCAD},
  crossref = {conf/iccad/2010},
  editor = {Scheffer, Louis and Phillips, Joel R. and Hu, Alan J.},
  ee = {http://dl.acm.org/citation.cfm?id=2133435},
  interhash = {5d86c8c38f78f8addf619357e6d98a25},
  intrahash = {677569641ae0305a7e4c8c34451ae3f7},
  isbn = {978-1-4244-8192-7},
  keywords = {dblp},
  pages = {25-31},
  publisher = {IEEE},
  timestamp = {2015-06-18T23:20:02.000+0200},
  title = {Analysis and optimization of SRAM robustness for double patterning lithography.},
  url = {http://dblp.uni-trier.de/db/conf/iccad/iccad2010.html#JoshiABS10},
  year = 2010
}
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