@inproceedings{ krizek_silver_2014,
  address = {Brno, Czech Republic},
  title = {Silver Catalysed Nanoscale Silicon Etchin in Water Vapour},
  isbn = {978-80-87294-55-0},
  abstract = {N+-doped silicon substrates were etched by water vapour under the silver nanoparticles acting as a catalyst.
Thin silver layer was deposited on two silicon wafers, where one of them was thermally annealed in nitrogen
to create silver nanoparticles. Subsequently, both samples were annealed in water vapour and afterwards
analysed by Scanning Electron Microscope. The images have shown that the annealed silver nanoparticles burrowed into the silicon substrate in the case of both samples. This new method of silicon etching introduces an alternative way of manufacturing nanohole arrays in silicon  substrates.},
  booktitle = {Nanocon 2014},
  publisher = {Tanger Ltd. Ostrava},
  author = {Křížek, Filip and Pikna, Peter and Fejfar, Antonín},
  month = {November},
  year = {2014},
  note = {00000}
}

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