Novolak resins with high thermal stability, high resolution, improved photospeed and etch characteristics for advanced photoresist applications. Khanna, D.; Durham, D.; Seyedi, F.; Lu, P.; and Perera, T. Polymer Engineering and Science, 32(20):1500--1508, 2004.
bibtex   
@Article{ OR005,
	title = "Novolak resins with high thermal stability, high resolution, improved photospeed and etch characteristics for advanced photoresist applications",
	author = "D.N. Khanna and D.L. Durham and F. Seyedi and P.H. Lu and T. Perera",
	journal = "Polymer Engineering and Science",
	volume = "32",
	number = "20",
	year = "2004",
	pages = "1500--1508"
}
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