@Article{ OR005,
	title = "Novolak resins with high thermal stability, high resolution, improved photospeed and etch characteristics for advanced photoresist applications",
	author = "D.N. Khanna and D.L. Durham and F. Seyedi and P.H. Lu and T. Perera",
	journal = "Polymer Engineering and Science",
	volume = "32",
	number = "20",
	year = "2004",
	pages = "1500--1508"
}

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