Mass spectrometric and Langmuir probe measurements in inductively coupled plasmas in Ar, CHF3/Ar and CHF3/Ar/O2 mixtures. Kim, J., Rao, M, Cappelli, M., Sharma, S., & Meyyappan, M Plasma Sources Science and Technology, 10(2):191–191, 2001. Query date: 2020-04-08 23:21:50bibtex @article{pop00032,
author = {JS Kim and M Rao and MA Cappelli and SP Sharma and M Meyyappan},
type = {Journal article},
title = {Mass spectrometric and Langmuir probe measurements in inductively coupled plasmas in Ar, CHF3/Ar and CHF3/Ar/O2 mixtures},
journal = {Plasma Sources Science and Technology},
citation = {https://scholar.google.com/citations?view_op=view_citation\&hl=en\&user=UXFidGcAAAAJ\&pagesize=100\&citation_for_view=UXFidGcAAAAJ:ufrVoPGSRksC},
year = {2001},
volume = {10},
number = {2},
pages = {191--191},
note = {44 cites: https://scholar.google.com/scholar?oi=bibs\&hl=en\&cites=10403681920178410099},
note = {Query date: 2020-04-08 23:21:50},
}
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