175% Modeling for Product-Line Evolution of Domain Artifacts. Lity, S., Nahrendorf, S., Thüm, T., Seidl, C., & Schaefer, I. In Capilla, R., Lochau, M., & Fuentes, L., editors, Proceedings of the 12th International Workshop on Variability Modelling of Software-Intensive Systems, VAMOS 2018, Madrid, Spain, February 7-9, 2018, pages 27–34, 2018. ACM.
175% Modeling for Product-Line Evolution of Domain Artifacts [link]Paper  doi  bibtex   
@inproceedings{DBLP:conf/vamos/LityNTSS18,
  author       = {Sascha Lity and
                  Sophia Nahrendorf and
                  Thomas Th{\"{u}}m and
                  Christoph Seidl and
                  Ina Schaefer},
  editor       = {Rafael Capilla and
                  Malte Lochau and
                  Lidia Fuentes},
  title        = {175{\%} Modeling for Product-Line Evolution of Domain Artifacts},
  booktitle    = {Proceedings of the 12th International Workshop on Variability Modelling
                  of Software-Intensive Systems, {VAMOS} 2018, Madrid, Spain, February
                  7-9, 2018},
  pages        = {27--34},
  publisher    = {{ACM}},
  year         = {2018},
  url          = {https://doi.org/10.1145/3168365.3168369},
  doi          = {10.1145/3168365.3168369},
  timestamp    = {Wed, 25 Mar 2020 00:00:00 +0100},
  biburl       = {https://dblp.org/rec/conf/vamos/LityNTSS18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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