@inProceedings{
 title = {Study of the surface oxidation epitaxy of pure Ni},
 type = {inProceedings},
 year = {2003},
 identifiers = {[object Object]},
 keywords = {Coated conductor buffer layer,Oxidation,RABiTS Ni},
 pages = {3531-3536},
 volume = {426-432},
 issue = {4},
 websites = {http://www.scopus.com/inward/record.url?eid=2-s2.0-0037999799&partnerID=tZOtx3y1},
 id = {f17173e0-23cc-35e9-a70b-1db14973340a},
 created = {2015-12-03T11:11:10.000Z},
 file_attached = {false},
 profile_id = {9495636f-d73f-34d2-b6ff-fe5dfa3a8841},
 group_id = {7a3bc460-f939-3cef-a7d0-3ac6b86952c3},
 last_modified = {2015-12-03T11:11:10.000Z},
 read = {false},
 starred = {false},
 authored = {false},
 confirmed = {true},
 hidden = {false},
 abstract = {The growth of nickel oxide (NiO) on 100<001> cube textured, rolling assisted biaxially textured substrates (RABiTS) of pure nickel was studied with respect to the oxidation time (tox) and temperature(tox), in oxygen and air. Single phase (100) NiO formed only in a narrow temperature range centred on 1240-1260°C (∼1250±10°C). At lower or higher temperatures, other orientations, namely (111), (311) and (220) also formed. At the optimum temperature of 1250±10°C, formation of practically single phase (100) NiO was observed for short oxidation, tox ≤ 10 min and for long oxidation,tox ≥ 120 min.},
 bibtype = {inProceedings},
 author = {Lockman, Z. and Qi, X. and Berenov, A. and Goldacker, W. and Nast, R. and DeBoer, B. and Holpfapzel, B. and MacManus-Driscoll, J. L.},
 booktitle = {Materials Science Forum}
}

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