Nanoscale patterning and oxidation of H-passivated Si(100)-2×1 surfaces with an ultrahigh vacuum scanning tunneling microscope. Lyding, J. W., Shen, T., Hubacek, J. S., Tucker, J. R., & Abeln, G. C. Applied Physics Letters, 64:2010, 1994. ![Nanoscale patterning and oxidation of H-passivated Si(100)-2×1 surfaces with an ultrahigh vacuum scanning tunneling microscope [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi bibtex @article{lyding_nanoscale_1994,
title = {Nanoscale patterning and oxidation of {H}-passivated {Si}(100)-2×1 surfaces with an ultrahigh vacuum scanning tunneling microscope},
volume = {64},
issn = {00036951},
url = {http://link.aip.org/link/APPLAB/v64/i15/p2010/s1&Agg=doi},
doi = {10.1063/1.111722},
urldate = {2011-10-06},
journal = {Applied Physics Letters},
author = {Lyding, J. W. and Shen, T.-C. and Hubacek, J. S. and Tucker, J. R. and Abeln, G. C.},
year = {1994},
pages = {2010},
}
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