In situ monitoring of atomic layer epitaxy via optical ellipsometry. Lyzwa, F, Marsik, P, Roddatis, V, Bernhard, C, Jungbauer, M, & Moshnyaga, V Journal of Physics D: Applied Physics, 51:125306, IOP Publishing, 2018. ![In situ monitoring of atomic layer epitaxy via optical ellipsometry [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi bibtex @article{10.1088/1361-6463/aaac64,
doi = {10.1088/1361-6463/aaac64},
url = {http://dx.doi.org/10.1088/1361-6463/aaac64},
year = 2018,
publisher = {{IOP} Publishing},
volume = {51},
pages = {125306},
author = {F Lyzwa and P Marsik and V Roddatis and C Bernhard and M Jungbauer and V Moshnyaga},
title = {In situ monitoring of atomic layer epitaxy via optical ellipsometry},
journal = {Journal of Physics D: Applied Physics}
}
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