Exposure characteristics of cobalt fluoride (CoF2) self-developing electron-beam resist on sub-100 nm scale. Malac, M., Schoefield, M., Zhu, Y., & Egerton, R. Journal of Applied Physics, 92(2):1112–1121, July, 2002.
Paper doi bibtex @article{malac_exposure_2002,
title = {Exposure characteristics of cobalt fluoride ({CoF2}) self-developing electron-beam resist on sub-100 nm scale},
volume = {92},
issn = {0021-8979, 1089-7550},
url = {http://aip.scitation.org/doi/10.1063/1.1487914},
doi = {10.1063/1.1487914},
language = {en},
number = {2},
urldate = {2017-09-03},
journal = {Journal of Applied Physics},
author = {Malac, Marek and Schoefield, Marvin and Zhu, Yimei and Egerton, Ray},
month = jul,
year = {2002},
pages = {1112--1121},
}
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