Exposure characteristics of cobalt fluoride (CoF2) self-developing electron-beam resist on sub-100 nm scale. Malac, M., Schoefield, M., Zhu, Y., & Egerton, R. Journal of Applied Physics, 92(2):1112–1121, July, 2002.
Exposure characteristics of cobalt fluoride (CoF2) self-developing electron-beam resist on sub-100 nm scale [link]Paper  doi  bibtex   
@article{malac_exposure_2002,
	title = {Exposure characteristics of cobalt fluoride ({CoF2}) self-developing electron-beam resist on sub-100 nm scale},
	volume = {92},
	issn = {0021-8979, 1089-7550},
	url = {http://aip.scitation.org/doi/10.1063/1.1487914},
	doi = {10.1063/1.1487914},
	language = {en},
	number = {2},
	urldate = {2017-09-03},
	journal = {Journal of Applied Physics},
	author = {Malac, Marek and Schoefield, Marvin and Zhu, Yimei and Egerton, Ray},
	month = jul,
	year = {2002},
	pages = {1112--1121},
}

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