Hydrogenated Silicon Nitride SiNx:H Deposited by Dielectric Barrier Discharge for Photovoltaics. Massines, F., Silva, J., Lelièvre, J., F., Bazinette, R., Vallade, J., Lecouvreur, P., & Pouliquen, S. Plasma Processes and Polymers, 13(1):170-183, 2016.
bibtex   
@article{
 title = {Hydrogenated Silicon Nitride SiNx:H Deposited by Dielectric Barrier Discharge for Photovoltaics},
 type = {article},
 year = {2016},
 identifiers = {[object Object]},
 keywords = {antireflective and passivation coating,atmospheric pressure discharges,dielectric barrier discharge (DBD),silicon nitride,solar cells},
 pages = {170-183},
 volume = {13},
 id = {4b15c259-c32f-33bd-af6f-83d1088b7444},
 created = {2018-11-01T17:24:24.879Z},
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 profile_id = {6c08603e-f5fc-34c8-a4d1-319cca2e54f4},
 group_id = {18670495-6d76-3294-a982-97e5d10d5ff5},
 last_modified = {2018-11-01T17:24:24.879Z},
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 citation_key = {Massines2016},
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 bibtype = {article},
 author = {Massines, Françoise and Silva, José and Lelièvre, Jean François and Bazinette, Rémy and Vallade, Julien and Lecouvreur, Paul and Pouliquen, Sylvain},
 journal = {Plasma Processes and Polymers},
 number = {1}
}

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