Investigation of high-k yttrium copper titanate thin films as alternative gate dielectrics. Monteduro, A., Ameer, Z., Rizzato, S., Martino, M., Caricato, A., Tasco, V., Lekshmi, I., Hazarika, A., Choudhury, D., Sarma, D., & Maruccio, G. Journal of Physics D: Applied Physics, 2016. Paper doi bibtex @ARTICLE{Monteduro2016,
author={Monteduro, A.G. and Ameer, Z. and Rizzato, S. and Martino, M. and Caricato, A.P. and Tasco, V. and Lekshmi, I.C. and Hazarika, A. and Choudhury, D. and Sarma, D.D. and Maruccio, G.},
title={Investigation of high-k yttrium copper titanate thin films as alternative gate dielectrics},
journal={Journal of Physics D: Applied Physics},
year={2016},
volume={49},
number={40},
doi={10.1088/0022-3727/49/40/405303},
art_number={405303},
url={https://www.scopus.com/inward/record.uri?eid=2-s2.0-84988976795&doi=10.1088%2f0022-3727%2f49%2f40%2f405303&partnerID=40&md5=234c2ae1152aef86033687706b991027},
document_type={Article},
source={Scopus},
}
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