Investigation of high-k yttrium copper titanate thin films as alternative gate dielectrics. Monteduro, A. G., Ameer, Z., Rizzato, S., Martino, M., Caricato, A. P., Tasco, V., Lekshmi, I. C., Hazarika, A., Choudhury, D., Sarma, D., & others Journal of Physics D: Applied Physics, 49(40):405303, IOP Publishing, 2016.
bibtex   
@article{monteduro2016investigation,
  title={Investigation of high-k yttrium copper titanate thin films as alternative gate dielectrics},
  author={Monteduro, Anna Grazia and Ameer, Zoobia and Rizzato, Silvia and Martino, Maurizio and Caricato, Anna Paola and Tasco, Vittorianna and Lekshmi, Indira Chaitanya and Hazarika, Abhijit and Choudhury, Debraj and Sarma, DD and others},
  journal={Journal of Physics D: Applied Physics},
  volume={49},
  number={40},
  pages={405303},
  year={2016},
  publisher={IOP Publishing}
}

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