Mid-Infrared (MIR) Complex Refractive Index Spectra of Polycrystalline Copper-Nitride Films by IR-VASE Ellipsometry and Their FIB-SEM Porosity. Márquez, E., Blanco, E., Mánuel, J. M., Ballester, M., García-Gurrea, M., Rodríguez-Tapiador, M. I., Fernández, S. M., Willomitzer, F., & Katsaggelos, A. K. Coatings, 14(1):5, MDPI, 2024. doi abstract bibtex Copper-nitride (Cu (Formula presented.) N) semiconductor material is attracting much attention as a potential, next-generation thin-film solar light absorber in solar cells. In this communication, polycrystalline covalent Cu (Formula presented.) N thin films were prepared using reactive-RF-magnetron-sputtering deposition, at room temperature, onto glass and silicon substrates. The very-broadband optical properties of the Cu (Formula presented.) N thin film layers were studied by UV-MIR (0.2–40 (Formula presented.) m) ellipsometry and optical transmission, to be able to achieve the goal of a low-cost absorber material to replace the conventional silicon. The reactive-RF-sputtered Cu (Formula presented.) N films were also investigated by focused ion beam scanning electron microscopy and both FTIR and Raman spectroscopies. The less dense layer was found to have a value of the static refractive index of 2.304, and the denser film had a value of 2.496. The iso-absorption gap, (Formula presented.), varied between approximately 1.3 and 1.8 eV and could be considered suitable as a solar light absorber.
@article{MarquezNavarro2024,
abstract = {Copper-nitride (Cu (Formula presented.) N) semiconductor material is attracting much attention as a potential, next-generation thin-film solar light absorber in solar cells. In this communication, polycrystalline covalent Cu (Formula presented.) N thin films were prepared using reactive-RF-magnetron-sputtering deposition, at room temperature, onto glass and silicon substrates. The very-broadband optical properties of the Cu (Formula presented.) N thin film layers were studied by UV-MIR (0.2–40 (Formula presented.) m) ellipsometry and optical transmission, to be able to achieve the goal of a low-cost absorber material to replace the conventional silicon. The reactive-RF-sputtered Cu (Formula presented.) N films were also investigated by focused ion beam scanning electron microscopy and both FTIR and Raman spectroscopies. The less dense layer was found to have a value of the static refractive index of 2.304, and the denser film had a value of 2.496. The iso-absorption gap, (Formula presented.), varied between approximately 1.3 and 1.8 eV and could be considered suitable as a solar light absorber.},
author = {M{\'{a}}rquez, Emilio and Blanco, Eduardo and M{\'{a}}nuel, Jos{\'{e}} M. and Ballester, Manuel and Garc{\'{i}}a-Gurrea, Marcos and Rodr{\'{i}}guez-Tapiador, Mar{\'{i}}a I. and Fern{\'{a}}ndez, Susana M. and Willomitzer, Florian and Katsaggelos, Aggelos K.},
doi = {10.3390/coatings14010005},
issn = {20796412},
journal = {Coatings},
keywords = {,electron microscopy,optical properties,solar energy,spectroscopic ellipsometry,thin films},
number = {1},
pages = {5},
publisher = {MDPI},
title = {{Mid-Infrared (MIR) Complex Refractive Index Spectra of Polycrystalline Copper-Nitride Films by IR-VASE Ellipsometry and Their FIB-SEM Porosity}},
volume = {14},
year = {2024}
}
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N thin film layers were studied by UV-MIR (0.2–40 (Formula presented.) m) ellipsometry and optical transmission, to be able to achieve the goal of a low-cost absorber material to replace the conventional silicon. The reactive-RF-sputtered Cu (Formula presented.) N films were also investigated by focused ion beam scanning electron microscopy and both FTIR and Raman spectroscopies. The less dense layer was found to have a value of the static refractive index of 2.304, and the denser film had a value of 2.496. 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