Plasma-based ion implantation and deposition: A review of physics, technology, and applications. Pelletier, J. & Anders, A. Plasma Science, IEEE Transactions on, 33(6):1944--1959, 2005.
Plasma-based ion implantation and deposition: A review of physics, technology, and applications [link]Paper  bibtex   
@article{pelletier_plasma-based_2005,
	title = {Plasma-based ion implantation and deposition: {A} review of physics, technology, and applications},
	volume = {33},
	shorttitle = {Plasma-based ion implantation and deposition},
	url = {http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=1556679},
	number = {6},
	urldate = {2012-12-13TZ},
	journal = {Plasma Science, IEEE Transactions on},
	author = {Pelletier, J. and Anders, A.},
	year = {2005},
	pages = {1944--1959}
}

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