Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process. Puurunen, R. L. Journal of Applied Physics, 2005.
doi  bibtex   
@article{Puurunen2005,
   author = {Riikka L. Puurunen},
   doi = {10.1063/1.1940727},
   issn = {00218979},
   issue = {12},
   journal = {Journal of Applied Physics},
   title = {Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process},
   volume = {97},
   year = {2005},
}

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