Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process. Puurunen, R. L. Journal of Applied Physics, 2005. doi bibtex @article{Puurunen2005,
author = {Riikka L. Puurunen},
doi = {10.1063/1.1940727},
issn = {00218979},
issue = {12},
journal = {Journal of Applied Physics},
title = {Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process},
volume = {97},
year = {2005},
}
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