Preparation and structure of AlW thin films. Radić, N., Tonejc, A., Milun, M., Pervan, P., Ivkov, J., & Stubičar, M. Thin Solid Films, 317(1-2):96-99, 1998. ![Preparation and structure of AlW thin films [link]](https://bibbase.org/img/filetypes/link.svg "link")
Website abstract bibtex Thin films of AlW alloys were prepared by co-deposition of pure aluminum and pure tungsten, each sputtered by an independently controlled magnetron source. The deposition rate at the substrate (glass, fused quartz, and alumina ceramic), positioned 5 cm away from the target surface was 0.1–0.2 nm/s for pure metals, and the final film thickness was a few $μ$m. Completely amorphous films were obtained in the Al80W20–Al67W33 composition range. At higher tungsten content, the W(Al) solid solution and pure tungsten phases appeared. The amorphous alloys exhibit a high negative temperature coefficient of the electric resistivity, increasing with the aluminum content up to −5.5·10−4 K−1. Finally, the amorphous AlW alloys exhibit a remarkable microhardness (6–7 GPa), and are structurally stable up to at least 400°C.
@article{
title = {Preparation and structure of AlW thin films},
type = {article},
year = {1998},
identifiers = {[object Object]},
keywords = {AlW alloys,Aluminum,Thin films,Tungsten},
pages = {96-99},
volume = {317},
websites = {http://linkinghub.elsevier.com/retrieve/pii/S0040609097005087},
id = {89314d5a-30e1-3228-b2ab-a87b842a16a2},
created = {2016-12-06T12:07:55.000Z},
file_attached = {false},
profile_id = {12182ba0-f80b-33ff-8da5-1813b38b682d},
group_id = {49ce86ba-a52a-36eb-a7fb-9e42f732edd5},
last_modified = {2017-03-14T17:25:32.499Z},
read = {false},
starred = {false},
authored = {false},
confirmed = {true},
hidden = {false},
citation_key = {Radic1993a},
source_type = {article},
private_publication = {false},
abstract = {Thin films of AlW alloys were prepared by co-deposition of pure aluminum and pure tungsten, each sputtered by an independently controlled magnetron source. The deposition rate at the substrate (glass, fused quartz, and alumina ceramic), positioned 5 cm away from the target surface was 0.1–0.2 nm/s for pure metals, and the final film thickness was a few $μ$m. Completely amorphous films were obtained in the Al80W20–Al67W33 composition range. At higher tungsten content, the W(Al) solid solution and pure tungsten phases appeared. The amorphous alloys exhibit a high negative temperature coefficient of the electric resistivity, increasing with the aluminum content up to −5.5·10−4 K−1. Finally, the amorphous AlW alloys exhibit a remarkable microhardness (6–7 GPa), and are structurally stable up to at least 400°C.},
bibtype = {article},
author = {Radić, Nikola and Tonejc, A and Milun, Milorad and Pervan, Petar and Ivkov, Jovica and Stubičar, Mirko},
journal = {Thin Solid Films},
number = {1-2}
}
Downloads: 0
{"_id":"zSvu5EFpPbzYE3ccq","bibbaseid":"radi-tonejc-milun-pervan-ivkov-stubiar-preparationandstructureofalwthinfilms-1998","downloads":0,"creationDate":"2016-12-06T12:13:38.447Z","title":"Preparation and structure of AlW thin films","author_short":["Radić, N.","Tonejc, A.","Milun, M.","Pervan, P.","Ivkov, J.","Stubičar, M."],"year":1998,"bibtype":"article","biburl":null,"bibdata":{"title":"Preparation and structure of AlW thin films","type":"article","year":"1998","identifiers":"[object Object]","keywords":"AlW alloys,Aluminum,Thin films,Tungsten","pages":"96-99","volume":"317","websites":"http://linkinghub.elsevier.com/retrieve/pii/S0040609097005087","id":"89314d5a-30e1-3228-b2ab-a87b842a16a2","created":"2016-12-06T12:07:55.000Z","file_attached":false,"profile_id":"12182ba0-f80b-33ff-8da5-1813b38b682d","group_id":"49ce86ba-a52a-36eb-a7fb-9e42f732edd5","last_modified":"2017-03-14T17:25:32.499Z","read":false,"starred":false,"authored":false,"confirmed":"true","hidden":false,"citation_key":"Radic1993a","source_type":"article","private_publication":false,"abstract":"Thin films of AlW alloys were prepared by co-deposition of pure aluminum and pure tungsten, each sputtered by an independently controlled magnetron source. The deposition rate at the substrate (glass, fused quartz, and alumina ceramic), positioned 5 cm away from the target surface was 0.1–0.2 nm/s for pure metals, and the final film thickness was a few $μ$m. Completely amorphous films were obtained in the Al80W20–Al67W33 composition range. At higher tungsten content, the W(Al) solid solution and pure tungsten phases appeared. The amorphous alloys exhibit a high negative temperature coefficient of the electric resistivity, increasing with the aluminum content up to −5.5·10−4 K−1. Finally, the amorphous AlW alloys exhibit a remarkable microhardness (6–7 GPa), and are structurally stable up to at least 400°C.","bibtype":"article","author":"Radić, Nikola and Tonejc, A and Milun, Milorad and Pervan, Petar and Ivkov, Jovica and Stubičar, Mirko","journal":"Thin Solid Films","number":"1-2","bibtex":"@article{\n title = {Preparation and structure of AlW thin films},\n type = {article},\n year = {1998},\n identifiers = {[object Object]},\n keywords = {AlW alloys,Aluminum,Thin films,Tungsten},\n pages = {96-99},\n volume = {317},\n websites = {http://linkinghub.elsevier.com/retrieve/pii/S0040609097005087},\n id = {89314d5a-30e1-3228-b2ab-a87b842a16a2},\n created = {2016-12-06T12:07:55.000Z},\n file_attached = {false},\n profile_id = {12182ba0-f80b-33ff-8da5-1813b38b682d},\n group_id = {49ce86ba-a52a-36eb-a7fb-9e42f732edd5},\n last_modified = {2017-03-14T17:25:32.499Z},\n read = {false},\n starred = {false},\n authored = {false},\n confirmed = {true},\n hidden = {false},\n citation_key = {Radic1993a},\n source_type = {article},\n private_publication = {false},\n abstract = {Thin films of AlW alloys were prepared by co-deposition of pure aluminum and pure tungsten, each sputtered by an independently controlled magnetron source. The deposition rate at the substrate (glass, fused quartz, and alumina ceramic), positioned 5 cm away from the target surface was 0.1–0.2 nm/s for pure metals, and the final film thickness was a few $μ$m. Completely amorphous films were obtained in the Al80W20–Al67W33 composition range. At higher tungsten content, the W(Al) solid solution and pure tungsten phases appeared. The amorphous alloys exhibit a high negative temperature coefficient of the electric resistivity, increasing with the aluminum content up to −5.5·10−4 K−1. Finally, the amorphous AlW alloys exhibit a remarkable microhardness (6–7 GPa), and are structurally stable up to at least 400°C.},\n bibtype = {article},\n author = {Radić, Nikola and Tonejc, A and Milun, Milorad and Pervan, Petar and Ivkov, Jovica and Stubičar, Mirko},\n journal = {Thin Solid Films},\n number = {1-2}\n}","author_short":["Radić, N.","Tonejc, A.","Milun, M.","Pervan, P.","Ivkov, J.","Stubičar, M."],"urls":{"Website":"http://linkinghub.elsevier.com/retrieve/pii/S0040609097005087"},"bibbaseid":"radi-tonejc-milun-pervan-ivkov-stubiar-preparationandstructureofalwthinfilms-1998","role":"author","keyword":["AlW alloys","Aluminum","Thin films","Tungsten"],"downloads":0},"search_terms":["preparation","structure","alw","thin","films","radić","tonejc","milun","pervan","ivkov","stubičar"],"keywords":["alw alloys","aluminum","thin films","tungsten"],"authorIDs":[]}