On modelling thermal oxidation of silicon II: numerical aspects. Rao, V. S, Hughes, T. J., & Garikipati, K. International Journal for Numerical Methods in Engineering, 47(1-3):359–377, 2000. Publisher: John Wiley & Sons, Ltd.![On modelling thermal oxidation of silicon II: numerical aspects [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi bibtex @article{rao2000modelling,
title = {On modelling thermal oxidation of silicon {II}: numerical aspects},
volume = {47},
url = {https://doi.org/10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z},
doi = {10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z},
number = {1-3},
journal = {International Journal for Numerical Methods in Engineering},
author = {Rao, Vinay S and Hughes, Thomas JR and Garikipati, Krishna},
year = {2000},
note = {Publisher: John Wiley \& Sons, Ltd.},
pages = {359--377},
}
Downloads: 0
{"_id":"CwMo2n8e7zvhKr7Dp","bibbaseid":"rao-hughes-garikipati-onmodellingthermaloxidationofsiliconiinumericalaspects-2000","author_short":["Rao, V. S","Hughes, T. J.","Garikipati, K."],"bibdata":{"bibtype":"article","type":"article","title":"On modelling thermal oxidation of silicon II: numerical aspects","volume":"47","url":"https://doi.org/10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z","doi":"10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z","number":"1-3","journal":"International Journal for Numerical Methods in Engineering","author":[{"propositions":[],"lastnames":["Rao"],"firstnames":["Vinay","S"],"suffixes":[]},{"propositions":[],"lastnames":["Hughes"],"firstnames":["Thomas","JR"],"suffixes":[]},{"propositions":[],"lastnames":["Garikipati"],"firstnames":["Krishna"],"suffixes":[]}],"year":"2000","note":"Publisher: John Wiley & Sons, Ltd.","pages":"359–377","bibtex":"@article{rao2000modelling,\n\ttitle = {On modelling thermal oxidation of silicon {II}: numerical aspects},\n\tvolume = {47},\n\turl = {https://doi.org/10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z},\n\tdoi = {10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z},\n\tnumber = {1-3},\n\tjournal = {International Journal for Numerical Methods in Engineering},\n\tauthor = {Rao, Vinay S and Hughes, Thomas JR and Garikipati, Krishna},\n\tyear = {2000},\n\tnote = {Publisher: John Wiley \\& Sons, Ltd.},\n\tpages = {359--377},\n}\n\n\n\n","author_short":["Rao, V. S","Hughes, T. J.","Garikipati, K."],"key":"rao2000modelling","id":"rao2000modelling","bibbaseid":"rao-hughes-garikipati-onmodellingthermaloxidationofsiliconiinumericalaspects-2000","role":"author","urls":{"Paper":"https://doi.org/10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.3.co;2-z"},"metadata":{"authorlinks":{}}},"bibtype":"article","biburl":"https://bibbase.org/zotero-group/compphys/5789834","dataSources":["pnuidRXbC87ribcT7","9ySafXXXhx8rxqW8v","kJD9wd56WxCQ38tRA"],"keywords":[],"search_terms":["modelling","thermal","oxidation","silicon","numerical","aspects","rao","hughes","garikipati"],"title":"On modelling thermal oxidation of silicon II: numerical aspects","year":2000}