@inproceedings{conf/amcc/RouquetteACT02,
  added-at = {2024-08-03T00:00:00.000+0200},
  author = {Rouquette, Sébastien and Autrique, Laurent and Chaussavoine, Charles and Thomas, Laurent},
  biburl = {https://www.bibsonomy.org/bibtex/29d094d0e3fa5a2dba6d4b8082254f316/dblp},
  booktitle = {ACC},
  crossref = {conf/amcc/2002},
  ee = {https://doi.org/10.1109/ACC.2002.1024522},
  interhash = {baafd173124d76eebc19eab8757b80a7},
  intrahash = {9d094d0e3fa5a2dba6d4b8082254f316},
  isbn = {0-7803-7298-0},
  keywords = {dblp},
  pages = {3813-3816},
  publisher = {IEEE},
  timestamp = {2024-08-05T07:46:14.000+0200},
  title = {3D thermal modeling of a plasma assisted chemical vapor deposition process.},
  url = {http://dblp.uni-trier.de/db/conf/amcc/acc2002.html#RouquetteACT02},
  year = 2002
}

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