An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. Scheckler, E. W., Tam, N. N., Pfau, A. K., & Neureuther, A. R. IEEE Trans. on CAD of Integrated Circuits and Systems, 12(9):1345-1356, 1993.
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. [link]Link  An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. [link]Paper  bibtex   
@article{journals/tcad/SchecklerTPN93,
  added-at = {2016-03-18T00:00:00.000+0100},
  author = {Scheckler, Edward W. and Tam, Nelson N. and Pfau, Anton K. and Neureuther, Andrew R.},
  biburl = {http://www.bibsonomy.org/bibtex/2bf3d876651b34817f9960583a380db68/dblp},
  ee = {http://dx.doi.org/10.1109/43.240082},
  interhash = {b3dcc90fc1bff1cd4024eeebb9913647},
  intrahash = {bf3d876651b34817f9960583a380db68},
  journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
  keywords = {dblp},
  number = 9,
  pages = {1345-1356},
  timestamp = {2016-03-19T11:40:51.000+0100},
  title = {An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification.},
  url = {http://dblp.uni-trier.de/db/journals/tcad/tcad12.html#SchecklerTPN93},
  volume = 12,
  year = 1993
}

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