@article{journals/mr/SanchezME04,
  added-at = {2016-01-29T00:00:00.000+0100},
  author = {Sánchez, V. and Munguía, J. and Estrada, Magali},
  biburl = {http://www.bibsonomy.org/bibtex/28ad54b1060725d1f2e3ca540b02f81b8/dblp},
  ee = {http://dx.doi.org/10.1016/j.microrel.2004.02.003},
  interhash = {3de8ea0c6f0dfc86195dd022178001ab},
  intrahash = {8ad54b1060725d1f2e3ca540b02f81b8},
  journal = {Microelectronics Reliability},
  keywords = {dblp},
  number = 5,
  pages = {885-888},
  timestamp = {2016-01-30T11:36:07.000+0100},
  title = {Photo-CVD process for ultra thin SiO2 films.},
  url = {http://dblp.uni-trier.de/db/journals/mr/mr44.html#SanchezME04},
  volume = 44,
  year = 2004
}

{"_id":"FtS9g8KNwWKnhtgBT","bibbaseid":"snchez-mungua-estrada-photocvdprocessforultrathinsio2films-2004","downloads":0,"creationDate":"2016-02-09T06:01:06.137Z","title":"Photo-CVD process for ultra thin SiO2 films.","author_short":["Sánchez, V.","Munguía, J.","Estrada, M."],"year":2004,"bibtype":"article","biburl":"http://www.bibsonomy.org/bib/author/Krishnakumar, V?items=1000","bibdata":{"bibtype":"article","type":"article","added-at":"2016-01-29T00:00:00.000+0100","author":[{"propositions":[],"lastnames":["Sánchez"],"firstnames":["V."],"suffixes":[]},{"propositions":[],"lastnames":["Munguía"],"firstnames":["J."],"suffixes":[]},{"propositions":[],"lastnames":["Estrada"],"firstnames":["Magali"],"suffixes":[]}],"biburl":"http://www.bibsonomy.org/bibtex/28ad54b1060725d1f2e3ca540b02f81b8/dblp","ee":"http://dx.doi.org/10.1016/j.microrel.2004.02.003","interhash":"3de8ea0c6f0dfc86195dd022178001ab","intrahash":"8ad54b1060725d1f2e3ca540b02f81b8","journal":"Microelectronics Reliability","keywords":"dblp","number":"5","pages":"885-888","timestamp":"2016-01-30T11:36:07.000+0100","title":"Photo-CVD process for ultra thin SiO2 films.","url":"http://dblp.uni-trier.de/db/journals/mr/mr44.html#SanchezME04","volume":"44","year":"2004","bibtex":"@article{journals/mr/SanchezME04,\n added-at = {2016-01-29T00:00:00.000+0100},\n author = {Sánchez, V. and Munguía, J. and Estrada, Magali},\n biburl = {http://www.bibsonomy.org/bibtex/28ad54b1060725d1f2e3ca540b02f81b8/dblp},\n ee = {http://dx.doi.org/10.1016/j.microrel.2004.02.003},\n interhash = {3de8ea0c6f0dfc86195dd022178001ab},\n intrahash = {8ad54b1060725d1f2e3ca540b02f81b8},\n journal = {Microelectronics Reliability},\n keywords = {dblp},\n number = 5,\n pages = {885-888},\n timestamp = {2016-01-30T11:36:07.000+0100},\n title = {Photo-CVD process for ultra thin SiO2 films.},\n url = {http://dblp.uni-trier.de/db/journals/mr/mr44.html#SanchezME04},\n volume = 44,\n year = 2004\n}\n\n","author_short":["Sánchez, V.","Munguía, J.","Estrada, M."],"key":"journals/mr/SanchezME04","id":"journals/mr/SanchezME04","bibbaseid":"snchez-mungua-estrada-photocvdprocessforultrathinsio2films-2004","role":"author","urls":{"Link":"http://dx.doi.org/10.1016/j.microrel.2004.02.003","Paper":"http://dblp.uni-trier.de/db/journals/mr/mr44.html#SanchezME04"},"keyword":["dblp"],"downloads":0},"search_terms":["photo","cvd","process","ultra","thin","sio2","films","sánchez","munguía","estrada"],"keywords":["dblp"],"authorIDs":[],"dataSources":["qcwuM7Zzcbynrts5v"]}