@article{ ISI:000074288000006,
Author = {Tanaka, A and Ko, MW and Kim, SY and Lee, SH and Kumagai, T},
Title = {{Friction and wear of diamondlike carbon films deposited using different
   methods under different conditions}},
Journal = {{DIAMOND FILMS AND TECHNOLOGY}},
Year = {{1998}},
Volume = {{8}},
Number = {{1}},
Pages = {{51-64}},
Abstract = {{Diamondlike carbon (DLC) films were deposited on Si and WC-Co alloys
   using radio-frequency plasma-assisted chemical vapor deposition (CVD)
   and physical vapor deposition (PVD), respectively. The resulting DLC
   films had a friction coefficient of less than 0.1 and a specific wear
   rate of the order of 10(-7) mm(3)/Nm in dry air; friction and wear were
   negligibly affected, either by the deposition method or by the substrate
   material in the present study. The friction coefficient of DLC films
   deposited on Si by CVD depended neither on substrate bias voltage nor on
   CH, gas pressure. When DLC films were rubbed against a SiC ball, the
   critical load at which the friction coefficient increased abruptly
   depended on the substrate bias voltage; the critical load for films
   deposited at -100 V was larger than that for films deposited at other
   bias voltages. The critical load also appeared to be correlated with the
   DLC film hydrogen content. CH, gas pressure, in contrast, had almost no
   effect on critical load in the present study. The friction coefficient
   in humid air was appreciably higher than in dry air.}},
ISSN = {{0917-4540}},
Unique-ID = {{ISI:000074288000006}},
}

{"_id":"o8Y9NqDskgrohJQLm","bibbaseid":"tanaka-ko-kim-lee-kumagai-frictionandwearofdiamondlikecarbonfilmsdepositedusingdifferentmethodsunderdifferentconditions-1998","authorIDs":[],"author_short":["Tanaka, A","Ko, M.","Kim, S.","Lee, S.","Kumagai, T"],"bibdata":{"bibtype":"article","type":"article","author":[{"propositions":[],"lastnames":["Tanaka"],"firstnames":["A"],"suffixes":[]},{"propositions":[],"lastnames":["Ko"],"firstnames":["MW"],"suffixes":[]},{"propositions":[],"lastnames":["Kim"],"firstnames":["SY"],"suffixes":[]},{"propositions":[],"lastnames":["Lee"],"firstnames":["SH"],"suffixes":[]},{"propositions":[],"lastnames":["Kumagai"],"firstnames":["T"],"suffixes":[]}],"title":"Friction and wear of diamondlike carbon films deposited using different methods under different conditions","journal":"DIAMOND FILMS AND TECHNOLOGY","year":"1998","volume":"8","number":"1","pages":"51-64","abstract":"Diamondlike carbon (DLC) films were deposited on Si and WC-Co alloys using radio-frequency plasma-assisted chemical vapor deposition (CVD) and physical vapor deposition (PVD), respectively. The resulting DLC films had a friction coefficient of less than 0.1 and a specific wear rate of the order of 10(-7) mm(3)/Nm in dry air; friction and wear were negligibly affected, either by the deposition method or by the substrate material in the present study. The friction coefficient of DLC films deposited on Si by CVD depended neither on substrate bias voltage nor on CH, gas pressure. When DLC films were rubbed against a SiC ball, the critical load at which the friction coefficient increased abruptly depended on the substrate bias voltage; the critical load for films deposited at -100 V was larger than that for films deposited at other bias voltages. The critical load also appeared to be correlated with the DLC film hydrogen content. CH, gas pressure, in contrast, had almost no effect on critical load in the present study. The friction coefficient in humid air was appreciably higher than in dry air.","issn":"0917-4540","unique-id":"ISI:000074288000006","bibtex":"@article{ ISI:000074288000006,\nAuthor = {Tanaka, A and Ko, MW and Kim, SY and Lee, SH and Kumagai, T},\nTitle = {{Friction and wear of diamondlike carbon films deposited using different\n methods under different conditions}},\nJournal = {{DIAMOND FILMS AND TECHNOLOGY}},\nYear = {{1998}},\nVolume = {{8}},\nNumber = {{1}},\nPages = {{51-64}},\nAbstract = {{Diamondlike carbon (DLC) films were deposited on Si and WC-Co alloys\n using radio-frequency plasma-assisted chemical vapor deposition (CVD)\n and physical vapor deposition (PVD), respectively. The resulting DLC\n films had a friction coefficient of less than 0.1 and a specific wear\n rate of the order of 10(-7) mm(3)/Nm in dry air; friction and wear were\n negligibly affected, either by the deposition method or by the substrate\n material in the present study. The friction coefficient of DLC films\n deposited on Si by CVD depended neither on substrate bias voltage nor on\n CH, gas pressure. When DLC films were rubbed against a SiC ball, the\n critical load at which the friction coefficient increased abruptly\n depended on the substrate bias voltage; the critical load for films\n deposited at -100 V was larger than that for films deposited at other\n bias voltages. The critical load also appeared to be correlated with the\n DLC film hydrogen content. CH, gas pressure, in contrast, had almost no\n effect on critical load in the present study. The friction coefficient\n in humid air was appreciably higher than in dry air.}},\nISSN = {{0917-4540}},\nUnique-ID = {{ISI:000074288000006}},\n}\n\n","author_short":["Tanaka, A","Ko, M.","Kim, S.","Lee, S.","Kumagai, T"],"key":"ISI:000074288000006","id":"ISI:000074288000006","bibbaseid":"tanaka-ko-kim-lee-kumagai-frictionandwearofdiamondlikecarbonfilmsdepositedusingdifferentmethodsunderdifferentconditions-1998","role":"author","urls":{},"downloads":0},"bibtype":"article","biburl":"http://nanotec.cnr.it/data/nanotec/nanotec-full.bib","creationDate":"2020-04-22T21:25:44.598Z","downloads":0,"keywords":[],"search_terms":["friction","wear","diamondlike","carbon","films","deposited","using","different","methods","under","different","conditions","tanaka","ko","kim","lee","kumagai"],"title":"Friction and wear of diamondlike carbon films deposited using different methods under different conditions","year":1998,"dataSources":["ZTEbWc6bW5f9DTsjF"]}