Photodissociation of H2O2 at 193 and 222 nm: Products and quantum yields. Vaghjani, G., L., Turnipseed, A., A., Warren, R., F., Ravishankara, A., R., & Thompson, J., E. Journal of Chemical Physics, 96(8):5878-5886, 1992. bibtex @article{
title = {Photodissociation of H2O2 at 193 and 222 nm: Products and quantum yields},
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journal = {Journal of Chemical Physics},
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