Photodissociation of H2O2 at 193 and 222 nm: Products and quantum yields. Vaghjani, G., L., Turnipseed, A., A., Warren, R., F., Ravishankara, A., R., & Thompson, J., E. Journal of Chemical Physics, 96(8):5878-5886, 1992.
bibtex   
@article{
 title = {Photodissociation of H2O2 at 193 and 222 nm: Products and quantum yields},
 type = {article},
 year = {1992},
 pages = {5878-5886},
 volume = {96},
 id = {6ec28087-0f74-37da-90ae-06a4d375a74a},
 created = {2015-05-08T02:32:42.000Z},
 file_attached = {false},
 profile_id = {f8c267c4-4c39-31dc-80fa-3a9691373386},
 group_id = {63e349d6-2c70-3938-9e67-2f6483f6cbab},
 last_modified = {2015-05-08T02:32:42.000Z},
 read = {false},
 starred = {false},
 authored = {false},
 confirmed = {true},
 hidden = {false},
 source_type = {Journal Article},
 bibtype = {article},
 author = {Vaghjani, G L and Turnipseed, A A and Warren, R F and Ravishankara, A R and Thompson, J E},
 journal = {Journal of Chemical Physics},
 number = {8}
}

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